Charged Particle Beam Lithography Atmospheric Pressure Correction

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Solution Overview

Problem

Current electron beam lithography technologies face challenges in maintaining high accuracy for pattern writing due to atmospheric pressure variations, which cause three-dimensional deviations in the relative distance and focus point between the electron lens barrel and the workpiece, leading to inaccuracies in pattern writing, especially with the miniaturization of semiconductor devices.

Innovation Solution

A charged-particle beam pattern writing method and apparatus that includes an air pressure measuring unit, a coordinate correction unit, a deflection amount computing unit, and a deflector unit to correct three-dimensional coordinate values and adjust the charged particle beam accordingly, ensuring precise pattern writing by measuring and compensating for atmospheric pressure changes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If electron beam lithography is used for high-precision pattern writing, then image resolution is improved, but pattern writing accuracy deteriorates due to atmospheric pressure variations

Engineering Contradiction:

Improveimage resolutionVSAvoidpattern writing accuracy

Core Design Contradiction:

Measurement precisionVSManufacturing precision

Solution Approach 1:

The system measures atmospheric pressure in real-time and uses this feedback to dynamically correct beam deflection amounts and stage positions, compensating for pressure-induced deviations and maintaining pattern writing accuracy despite environmental variations

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The system changes operational parameters (beam deflection amounts, stage positions) based on measured atmospheric pressure values, adjusting these parameters in real-time to compensate for pressure-induced deviations and maintain writing accuracy

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If atmospheric pressure is kept constant, then pattern writing accuracy is improved, but adaptability to environmental changes deteriorates

Engineering Contradiction:

Improvepattern writing accuracyVSAvoidenvironmental adaptability

Core Design Contradiction:

Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The system transitions from static pressure control to dynamic compensation, continuously measuring atmospheric pressure and adjusting beam deflection and stage positions in real-time, enabling the system to adapt to environmental changes while maintaining writing accuracy

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The system dynamically changes operational parameters (deflection amounts, coordinates) based on measured atmospheric pressure, allowing adaptation to varying environmental conditions while preserving pattern writing precision

Inventive Principle:

Principle #35Parameter changes

3Manufacturing precision

If three-dimensional correction is implemented, then pattern writing accuracy is improved, but device complexity increases

Engineering Contradiction:

Improvepattern writing accuracyVSAvoidcorrection system complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The atmospheric pressure measurement system serves multiple functions: it corrects beam deflection positions, adjusts stage positions, and compensates for focus variations, achieving comprehensive three-dimensional correction through a single measurement source

Inventive Principle:

Principle #6Universality (Multi-functionality)

Solution Approach 2:

Atmospheric pressure serves as an intermediary parameter that links environmental conditions to multiple correction actions (beam deflection, stage positioning, focus adjustment), coordinating these corrections through a common reference measurement

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables real-time correction of pattern writing position and beam focus position deviations caused by atmospheric pressure changes, thereby maintaining high accuracy and precision in pattern writing, even with the increasing miniaturization of semiconductor devices.

Implementation Method 1

an air pressure measuring unit for measuring a value of an atmospheric pressure

Methodology Applied

Scientific EffectAtmospheric pressure measurement:

Implementation Method 2

a deflector for deflecting the charged particle beam by use of a deflection amount

Methodology Applied

Scientific EffectBeam deflection:

Implementation Method 3

an objective lens for focusing the charged particle beam on the workpiece

Methodology Applied

Scientific EffectElectromagnetic focusing:

Data Source

PatentUS7589335B2Charged-particle beam pattern writing method and apparatus and software program for use therein

Publication Date: 2009.09.15 NUFLARE TECH INC

AI summary

A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.