Multiple Charged Particle Beam Lithography Position Deviation Correction
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Solution Overview
Problem
In multiple beam lithography, it is challenging to accurately correct position deviations caused by distortion of the reflecting surface of a mirror and/or the target object surface, leading to deteriorated resolution and accuracy in lithography position and line width.
Innovation Solution
A multiple charged particle beam lithography apparatus and method that divides the lithography region into pixel regions and groups them into pixel blocks, allowing for position deviation correction at the pixel block level, with a dose calculation for each pixel to ensure accurate beam irradiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple beams are irradiated at one time to improve throughput, then productivity increases, but position correction becomes difficult leading to deteriorated manufacturing precision
Solution Approach 1:
The patent divides the lithography region into multiple pixel blocks and processes position correction for each block separately. This segmentation allows the system to maintain multiple beam irradiation for high throughput while applying position-specific corrections to each beam group, thereby resolving the contradiction between productivity and manufacturing precision.
2Manufacturing precision
If dose is distributed to adjacent pixels to correct position deviation, then position accuracy improves, but beam profile steepness decreases leading to deteriorated resolution
Solution Approach 1:
The patent applies position correction locally to each pixel block rather than distributing dose across adjacent pixels. By correcting positions at the pixel block level and calculating dose for each pixel based on its corrected position, the system maintains both position accuracy and beam profile steepness, avoiding resolution deterioration.
3Manufacturing precision
If coordinate system correction is performed for the entire surface, then manufacturing precision improves, but device complexity increases due to mesh division and vertex measurement
Solution Approach 1:
The patent divides the coordinate system correction into smaller pixel block units rather than correcting the entire surface at once. This segmentation reduces the complexity of measurement and correction operations while maintaining overall manufacturing precision, as each pixel block can be processed independently with simpler measurement requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise correction of position deviations, improving the resolution and accuracy of lithography patterns by ensuring each pixel is illuminated with the calculated dose, thereby maintaining high accuracy in lithography position and line width.
Implementation Method 1
a deflector, and a stage on which a target object is placed and which writes a pattern on the target object by using the multiple charged particle beams
Data Source
AI summary
According to one aspect of the present invention, a multiple charged particle beam lithography apparatus includes a circuitry configured to divide a lithography region of a target object into a plurality of pixel regions having a mesh shape and being irradiated with multiple charged particle beams; a circuitry configured to group the plurality of pixel regions into a plurality of pixel blocks configured with at least one pixel region; a circuitry configured to correct position deviation in unit of a pixel block for each pixel block of the plurality of pixel blocks; a dose calculating processing circuitry configured to calculate a dose being irradiated on the pixel concerned for each pixel where the position deviation is corrected; and a mechanism configured to write a pattern on the target object by using the multiple charged particle beams so that each pixel is illuminated with the calculated dose.