Charged Particle Beam Lithography Target Positioning Device
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing charged particle beam lithography systems lack suitable target positioning devices that are optimized for vacuum compatibility, size, and cost, and electromagnetic actuators can disrupt the charged particle beams due to electromagnetic fields, leading to positioning inaccuracies.
Innovation Solution
A charged particle beam lithography system with a target positioning device featuring a carrier and stage that moves in one direction, using actuators and retaining means to maintain the target's position without disturbing the charged particle beams, including piezoelectric motors and clamping mechanisms to minimize magnetic and electric field fluctuations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If electromagnetic actuators are used to move the target positioning device, then positioning capability is improved, but electromagnetic fields disrupt the charged particle beams causing positioning inaccuracies
Solution Approach 1:
The patent extracts and removes electromagnetic actuators from the vacuum chamber environment, placing them outside the charged particle beam path. This eliminates the source of electromagnetic interference while preserving the positioning function through alternative actuation mechanisms that do not generate disruptive fields.
Solution Approach 2:
The patent introduces retaining means as an intermediary mechanism between the stage and carrier. This mediator maintains precise positioning without requiring continuous electromagnetic actuation during exposure, thereby eliminating electromagnetic disruption to the charged particle beams while preserving positioning accuracy.
2Adaptability or versatility
If conventional stages are adapted for maskless lithography, then basic positioning function is achieved, but size, costs and vacuum compatibility are inadequate
Solution Approach 1:
The patent segments the positioning system into distinct functional components: a stage for coarse positioning and a carrier with retaining means for fine positioning and stabilization. This segmentation allows each component to be optimized for its specific function, with the carrier-staging system designed specifically for vacuum compatibility and charged particle beam exposure requirements.
Solution Approach 2:
The patent changes the operational parameters of the positioning system by introducing retaining means that lock the carrier to the stage during exposure. This parameter change from continuous movement to locked stabilization enables vacuum compatibility and eliminates positioning drift, making the system suitable for maskless lithography.
3Ease of operation
If the carrier is made displaceable on the stage, then positioning flexibility is improved, but stability during projection deteriorates
Solution Approach 1:
The patent implements a dynamic positioning system where the carrier can be displaced on the stage during repositioning phases, then locked in place during exposure phases. The retaining means enable this dynamic behavior, providing both positioning flexibility when needed and stability during projection by switching between displaced and locked states.
Solution Approach 2:
The patent applies preliminary anti-action by using retaining means to prevent carrier displacement during exposure. This preemptive locking action counteracts any potential instability before it can affect the projection, ensuring position stability while maintaining the ability to displace the carrier when repositioning is required.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise and stable exposure of elongated areas on the target with reduced electromagnetic interference, enhancing the accuracy and efficiency of the charged particle beam projection process.
Implementation Method 1
the target positioning device comprises a piezoelectric motor for moving the carrier in the second direction
Implementation Method 2
electrostatic lens structures for the purpose of focussing and deflecting one or a multiplicity of charged particle beams
Implementation Method 3
the column comprises deflecting means for deflecting the charged particle beam in a deflection direction
Data Source
AI summary
The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.