Beam manipulator in charged particle-beam apparatus
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Solution Overview
Problem
Current charged particle beam illumination systems, such as those used in semiconductor manufacturing, face challenges in generating high-quality multi-beams for inspection and lithography due to aberrations that result in blurry and out-of-focus images, degrading the quality of inspection results.
Innovation Solution
A charged particle beam illumination apparatus with a manipulator array featuring doped substrate electrodes and recesses to isolate adjacent electrodes, creating an electrically insulating region, which helps in manipulating charged particle beams to reduce aberrations and improve image focus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional electrode structures are used in charged particle beam manipulators, then the device complexity is reduced, but image quality deteriorates due to aberrations and electrical interference between adjacent electrodes
Solution Approach 1:
The manipulator structure is segmented into electrically isolated electrode regions separated by recesses. This segmentation prevents electrical interference between adjacent electrodes while maintaining manageable device complexity through modular design.
Solution Approach 2:
Different regions of the manipulator are given different properties: electrodes are conductive for beam manipulation, while recesses provide electrical insulation. This local differentiation of properties reduces aberrations and improves image quality without requiring complete structural redesign.
2Volume of moving object
If adjacent electrodes are placed close together to reduce manipulator size, then the device compactness is improved, but electrical interference between electrodes increases causing aberrations
Solution Approach 1:
Recesses are introduced as intermediary structures between adjacent electrodes. These recesses provide electrical insulation that prevents harmful electrical interference while allowing electrodes to remain in close proximity for compact manipulator design.
Solution Approach 2:
The harmful electrical field interference is extracted or removed from the space between electrodes by introducing recesses that eliminate the direct electrical coupling between adjacent electrodes, allowing compact positioning without interference.
3Measurement precision
If high electrode density is used to improve beam manipulation precision, then the manipulation accuracy is improved, but the complexity of electrical isolation between electrodes increases
Solution Approach 1:
The high-density electrode structure is segmented into isolated regions by recesses. This segmentation approach allows high electrode density for precise beam manipulation while the recesses automatically provide the necessary electrical isolation, reducing the complexity of isolation design.
Solution Approach 2:
The functions of electrode positioning and electrical isolation are merged into a single integrated structure where recesses simultaneously serve as both structural features and electrical insulation barriers, simplifying the overall design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the quality of images produced during inspection by minimizing aberrations, allowing for higher throughput and accuracy in detecting micro and nano-scale defects on semiconductor substrates.
Implementation Method 1
an inner wall of the through-passage between the major surfaces comprising a plurality of electrodes configured to manipulate the charged particle beam
Implementation Method 2
each recess defining a gap between the adjacent electrodes and further comprising an electrically insulating region between the adjacent electrodes
Data Source
AI summary
Disclosed herein is a manipulator or an array of manipulator. A manipulator manipulates a charged particle beam in a projection system. The manipulator comprising a substrate with major surfaces and a through-passage between associated apertures in the major surfaces. The through passage configured for passage of a path of a charged particle beam. An inner wall of the through-passage between the major surfaces comprises a plurality of electrodes configured to manipulate the charged particle beam. Each electrode comprises doped substrate. The through-passage comprises recesses that extend away from the path of the charged particle beam. Each recess defines a gap between the adjacent electrodes and further comprising an electrically insulating region between the adjacent electrodes. The recesses extend behind at least one of the adjacent electrodes relative to the path of the charged particle beam and comprising at least part of the electrically insulating region.