Electrostatic Beam Manipulator With Integrated Voltage Divider
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Solution Overview
Problem
Current charged particle tools used for inspecting semiconductor IC chips face challenges in achieving high throughput and image quality due to aberrations and defocus effects caused by the manipulation of electron beams, which degrade the inspection process and reduce yield.
Innovation Solution
A manipulator for charged particle beams is designed with a substrate having opposing major surfaces and a potential divider comprising resistive elements connected in series, allowing for the distribution of voltage across electrodes to minimize aberrations and improve beam alignment, thereby enhancing the density and alignment of sub-beams in a multi-beam configuration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If electron beams are manipulated to increase beam density and reduce pitch between sub-beams, then productivity and inspection throughput are improved, but aberrations and defocus effects increase which degrade image quality
Solution Approach 1:
The manipulator is divided into multiple independent electrode structures, each capable of manipulating individual sub-beams. This segmentation allows independent control of each sub-beam's path and focus, enabling high beam density while correcting aberrations for each beam separately, thus resolving the contradiction between throughput and image quality
Solution Approach 2:
Different regions of the manipulator are designed with different electrode configurations and potentials tailored to local beam requirements. Each sub-beam receives customized manipulation to correct its specific aberrations and defocus effects, maintaining high image quality across the entire multi-beam system while achieving high productivity
2Productivity
If the number of sub-beams is increased to improve inspection throughput, then productivity increases, but the complexity of beam manipulation and alignment increases
Solution Approach 1:
Multiple electrode structures are combined into a single integrated manipulator assembly that handles all sub-beams simultaneously. The shared substrate and coordinated electrode control reduce the overall system complexity compared to having separate manipulators for each sub-beam, while still enabling independent control of multiple beams to achieve high throughput
3Ease of manufacture
If resistive elements are formed within the substrate to distribute voltage across electrodes, then device complexity is reduced and ease of manufacture is improved, but the precision of voltage distribution and beam control may be affected
Solution Approach 1:
The resistive elements within the substrate allow continuous adjustment of voltage distribution parameters across the electrode array. By modifying resistance values and their spatial distribution, precise voltage gradients can be created to control beam paths and focus, achieving both ease of manufacture through integrated substrate formation and precise beam control through parameter optimization
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution improves the throughput and image quality of charged particle tools by reducing aberrations and increasing the density of sub-beams, leading to higher yield and more efficient inspection processes.
Implementation Method 1
A manipulator for charged particle beams is designed with a substrate having opposing major surfaces and a potential divider comprising resistive elements connected in series, allowing for the distribution of voltage across electrodes
Implementation Method 2
the manipulator further comprising a potential divider comprising two or more resistive elements connected in series, the potential divider comprising an intermediate node between each pair of adjacent resistive elements, wherein at least one resistive element is formed within the substrate so as to extend between the opposing major surfaces
Data Source
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AI summary
A manipulator for manipulating a charged particle beam in a projection system, the manipulator comprising a substrate having opposing major surfaces in each of which is defined an aperture and a through-passage having an interconnecting surface extending between the apertures; wherein the interconnecting surface comprises one or more electrodes; the manipulator further comprising a potential divider comprising two or more resistive elements connected in series, the potential divider comprising an intermediate node between each pair of adjacent resistive elements, wherein at least one resistive element is formed within the substrate so as to extend between the opposing major surfaces; wherein the intermediate node is electrically connected to at least one of the one or more electrodes.