Charged Particle Beam Masking for Laser Micromachining
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Solution Overview
Problem
Existing laser micromachining techniques face challenges in achieving high resolution and precision due to the inherent limitations of laser beam wavelength and material removal rates, particularly in determining the endpoint for sequential processing with charged particle beams.
Innovation Solution
A high-resolution mask is fabricated using charged particle beam processing and deposited directly on the work piece, allowing for improved lateral resolution and aspect ratios by differentiating the ablation thresholds of the mask and substrate materials, enabling precise control over laser beam exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If laser micromachining is used to achieve high material removal rates, then productivity is improved, but manufacturing precision deteriorates due to the longer beam wavelength limiting minimum spot size
Solution Approach 1:
The invention segments the micromachining process into two distinct stages: a laser processing stage for rapid material removal, and a charged particle beam stage for high-precision final machining. This segmentation allows each process to operate at its optimal capability, with the laser handling bulk removal and the particle beam providing sub-wavelength precision for the final structure.
Solution Approach 2:
The laser performs preliminary action by removing the majority of material before the charged particle beam completes the micromachining. This preliminary material removal reduces the workload for the precision particle beam process, enabling it to focus on achieving the final high-precision dimensions without excessive material removal time.
2Manufacturing precision
If charged particle beam processing is used to achieve high resolution, then manufacturing precision is improved, but productivity deteriorates due to limited beam current
Solution Approach 1:
The invention segments the micromachining process into two distinct stages: a laser processing stage for rapid material removal, and a charged particle beam stage for high-precision final machining. This segmentation allows each process to operate at its optimal capability, with the laser handling bulk removal and the particle beam providing sub-wavelength precision for the final structure.
Solution Approach 2:
The laser performs preliminary action by removing the majority of material before the charged particle beam completes the micromachining. This preliminary material removal reduces the workload for the precision particle beam process, enabling it to focus on achieving the final high-precision dimensions without excessive material removal time.
3Manufacturing precision
If sequential processing with laser followed by charged particle beam is used, then both productivity and precision can be achieved, but device complexity increases due to the need for endpoint detection
Solution Approach 1:
The invention implements feedback through real-time monitoring of secondary electron emission during charged particle beam processing. This feedback mechanism provides continuous information about the micromachining progress and material removal rate, enabling dynamic adjustment of processing parameters and automatic endpoint detection without complex external measurement systems.
Solution Approach 2:
The charged particle beam process serves itself by using its own secondary electron emission signal as the endpoint detection mechanism. This self-service approach eliminates the need for separate, complex endpoint detection equipment, simplifying the overall system while maintaining precise control over the sequential processing transition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the resolution and precision of laser micromachining by creating features with improved lateral resolution and aspect ratios, addressing the limitations of conventional laser micromachining and enabling more accurate endpoint detection.
Implementation Method 1
A mask is formed on a surface of the work piece through charged particle beam processing
Implementation Method 2
The work piece is exposed to a laser beam through the mask and ablated
Data Source
AI summary
An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.


