Charged Particle Beam Optical Correction for Consistent Device Measurement

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing charged particle beam apparatuses face errors in estimating electrical characteristics of semiconductor devices due to interactions between multiple devices, and these errors are exacerbated when using different apparatuses, leading to inconsistencies in measurement results.

Innovation Solution

A charged particle beam apparatus that includes a database for device models, a charged particle beam optical system, a detector for secondary electrons, and a computing unit to generate a netlist and correct optical conditions based on comparison between estimated and actual application results, thereby reducing errors between apparatuses.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If electrical characteristics are estimated using multiple different charged particle beam apparatuses, then more measurement data can be obtained, but errors and inconsistencies in the estimation results increase between apparatuses

Engineering Contradiction:
Improvemeasurement dataVSAvoidestimation result consistency
Core Design Contradiction:
Quantity of substanceVSMeasurement precision

Solution Approach 1:

The patent applies parameter changes by systematically varying optical conditions (acceleration voltage, beam current, focus settings) and comparing measurement results across different parameters. This allows identification of optimal parameter ranges that minimize apparatus-specific errors while maintaining measurement consistency across multiple devices.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements feedback mechanisms where measurement results from multiple apparatuses are compared and analyzed, and correction factors are applied based on the observed discrepancies. This feedback loop enables continuous improvement of measurement consistency by adjusting estimation algorithms based on actual inter-apparatus variations.

Inventive Principle:
Principle #23Feedback

2Ease of operation

If optical conditions are not corrected between apparatuses, then measurement process remains simple, but errors in charged particle beam application results occur between different apparatuses

Engineering Contradiction:
Improvemeasurement process simplicityVSAvoidbeam application result accuracy
Core Design Contradiction:
Ease of operationVSMeasurement precision

Solution Approach 1:

The patent applies preliminary action by pre-characterizing each charged particle beam apparatus through standardized measurements and storing correction factors in advance. Before actual sample measurements, the system retrieves and applies the appropriate correction factors, eliminating the need for complex real-time adjustments while ensuring accuracy.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent introduces an intermediary correction mechanism that acts as a mediator between the raw measurement data and the final results. Correction factors serve as this intermediary, translating measurements from different apparatuses into a common reference frame, thereby simplifying the overall measurement process while maintaining precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively reduces errors in charged particle beam application results between different apparatuses by correcting optical conditions, ensuring consistent and accurate measurements of semiconductor devices.

Implementation Method 1

a detector configured to detect secondary electrons emitted from the sample or the correction sample excited by the application of the charged particle beam

Methodology Applied
Scientific EffectSecondary electron emission: Electron Impact Desorption

Data Source

PatentUS11749494B2Charged particle beam apparatus
Publication Date: 2023.09.05 HITACHI HIGH TECH CORP
  • US11749494B2 patent drawing
  • US11749494B2 patent drawing
  • US11749494B2 patent drawing

AI summary

A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.