Charged Particle Beam Pattern Writing Data Conversion
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The increasing integration density of LSIs leads to a significant increase in the amount of layout data required for semiconductor manufacturing, resulting in longer data conversion times and reduced throughput in pattern writing apparatuses, as existing methods necessitate splitting and rearranging patterns across multiple deflection regions, thereby increasing data complexity.
Innovation Solution
A method is introduced to generate partial patterns within each deflection region from input layout data, allowing for the conversion of layout data into charged particle beam pattern writing data without splitting the cell across regions, thereby reducing the amount of layout data and simplifying the data conversion process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If layout data is split and rearranged across multiple deflection regions, then the pattern can be written within deflection region constraints, but the data complexity increases and conversion time lengthens
Solution Approach 1:
The patent divides the layout data into multiple cell groups, where each group can be independently processed and written within a single deflection region. This segmentation allows the writing apparatus to handle complex patterns without requiring complex data rearrangement, as each cell group is self-contained and can be written sequentially.
Solution Approach 2:
The patent performs preliminary division of layout data into cell groups before the writing process. By pre-organizing the data structure into manageable cell groups with defined reference points and coordinate systems, the system eliminates the need for complex real-time data rearrangement during writing, thus reducing data complexity while maintaining writing precision.
2Manufacturing precision
If layout data is split and rearranged across multiple deflection regions, then the pattern can be written within deflection region constraints, but the data conversion time increases
Solution Approach 1:
By segmenting layout data into independent cell groups that can be processed separately, the patent enables parallel processing and eliminates the need for sequential data rearrangement operations. Each cell group is converted and written independently, significantly reducing total data conversion time while maintaining writing accuracy through consistent coordinate system transformations.
Solution Approach 2:
The patent performs all necessary data division and coordinate system setup in advance, before the actual writing process begins. This preliminary organization of layout data into cell groups with pre-calculated reference points eliminates time-consuming data rearrangement operations during the writing phase, thus reducing data conversion time while preserving writing precision.
3Adaptability or versatility
If the amount of layout data increases due to high integration density, then more complex circuits can be manufactured, but the throughput of pattern writing apparatuses decreases
Solution Approach 1:
The patent divides complex high-density circuit layout data into multiple independent cell groups, each containing a subset of the total patterns. This segmentation allows the writing apparatus to process and write each cell group independently and sequentially, effectively managing large data volumes without reducing throughput. The segmentation transforms one large complex writing task into multiple smaller, manageable tasks that can be executed efficiently.
4Manufacturing precision
If cells are split across deflection regions, then patterns can be written within deflection constraints, but the amount of layout data increases
Solution Approach 1:
Instead of splitting individual cells across deflection regions, the patent segments the overall layout into cell groups that remain intact within single deflection regions. This approach maintains the original cell structures without fragmentation, thus avoiding the data multiplication that would result from splitting and redistributing cell portions across multiple regions. Each cell group is written as a cohesive unit, preserving data efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the amount of layout data, shortens data transmission times, and enhances the throughput of pattern writing apparatuses by allowing partial patterns to be generated and allocated within each deflection region, thus improving the efficiency of the data conversion process.
Implementation Method 1
a charged particle beam writing apparatus which writes a figure pattern on a target object by using a charged particle beam
Data Source
AI summary
A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes inputting the layout data including a pattern ranging over a plurality of deflection regions, generating a partial pattern which can be deflected in a self region in the ranging pattern for each of the plurality of deflection regions on the basis of the input layout data, and converting layout data including a partial pattern for each of the deflection regions into charged particle beam pattern writing data to output the charged particle beam pattern writing data.