Charged Particle Beam Pixel Interval Control for Processing Accuracy
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Charged particle beam processing apparatuses face challenges in displaying the entirety of a processing region within one screen and achieving high processing accuracy due to increased field-of-view magnification and beam diameter limitations, resulting in incomplete irradiation and spotted processing results.
Innovation Solution
A charged particle beam apparatus and method that control the beam to irradiate at different pixel intervals for different regions within a processing area, allowing for accurate alignment and coverage of the entire processing region by shifting irradiation positions in sub-pixel units and performing multiple scans to reduce unirradiated areas, while maintaining high-definition image formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If field-of-view magnification is increased to improve processing accuracy, then processing accuracy is improved, but the processing region cannot fall within one field of view
Solution Approach 1:
The patent divides the processing region into multiple regions and assigns different pixel intervals to different regions. Specifically, a first pixel interval is used for a first region and a second pixel interval (different from the first) is used for a second region, allowing the entire processing region to be displayed within one screen while maintaining high processing accuracy in critical areas.
2Manufacturing precision
If beam diameter is reduced to improve processing accuracy, then processing accuracy is improved, but unirradiated portions are generated within the processing range
Solution Approach 1:
The patent applies different pixel intervals to different regions of the processing area. By using a first pixel interval for a first region and a second pixel interval for a second region, the system ensures complete beam coverage in all areas while maintaining high processing accuracy where needed, eliminating the spotted processing results caused by unirradiated portions.
Data Source
AI summary
A charged particle beam apparatus has a charged particle beam column configured to irradiate a charged particle beam, and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region. The first and second regions include plural first and second pixels each including first and second sub-pixels which are irradiated by the charged particle beam to generate secondary electrons. First and second sub-pixel images are formed based on the detected secondary electrons, and the first and second sub-pixel images are synthesized to form first and second images.