Beam Apparatus Positioning After Object Tilt Using Reference Marking
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Solution Overview
Problem
Existing methods for determining the position of an object in a beam apparatus, such as electron or ion beam microscopes, are inaccurate when the object is tilted, as the relative position of markings or structures on the object's surface changes due to different working distances from the objective lens, leading to potential misalignment of the beam.
Innovation Solution
A method that involves generating a marking on the object and using a processor unit to determine the position of a predefinable region relative to the marking by measuring distances along multiple axes before and after tilting the object, allowing for accurate positioning even after rotation, by adjusting the object stage or beam deflection devices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the object is tilted to enable multi-angle imaging or processing, then the versatility of the beam apparatus is improved, but the position determination accuracy deteriorates due to changes in relative positions of markings
Solution Approach 1:
The patent transitions from two-dimensional position determination (before tilting) to three-dimensional position determination (after tilting). By measuring distances along multiple axes (x, y, and z) and calculating spatial coordinates, the system maintains position determination accuracy even when the object is tilted, thus resolving the contradiction between versatility improvement and measurement precision deterioration.
Solution Approach 2:
The patent implements a feedback mechanism where the processor unit continuously calculates the position of the predefinable region based on measured distances from markings, and uses this information to adjust the beam direction or object stage position. This feedback loop ensures accurate position determination is maintained despite object tilting, resolving the contradiction between versatility and measurement precision.
2Measurement precision
If multiple distance measurements along multiple axes are performed to maintain position accuracy after tilting, then the position determination accuracy is improved, but the device complexity increases
Solution Approach 1:
The patent makes the existing beam apparatus and detector system perform multiple functions: they are used both for primary imaging/processing and for position determination measurements. The same beam apparatus that images the object also measures distances to markings, eliminating the need for separate measurement devices and reducing overall system complexity despite the increased measurement requirements.
Solution Approach 2:
The system uses its own components (beam apparatus, detector, processor unit) to perform position determination measurements without requiring external specialized equipment. The beam apparatus measures distances to markings and calculates positions autonomously, making the system self-sufficient and avoiding additional device complexity.
3Measurement precision
If the beam direction or object stage is adjusted based on calculated position to maintain accurate alignment, then the alignment precision is improved, but the operation complexity increases
Solution Approach 1:
The processor unit automatically calculates the position of the predefinable region and determines the necessary adjustments to beam direction or object stage position without requiring manual intervention. The system self-corrects alignment based on measured positions, maintaining high alignment precision while minimizing operational complexity through automation.
Solution Approach 2:
The system implements automatic feedback control where the processor unit continuously monitors the position of the predefinable region relative to the beam, calculates required adjustments, and automatically adjusts the beam direction or object stage. This closed-loop feedback system maintains accurate alignment without requiring complex manual operations.
Data Source
AI summary
The invention relates to a method for determining a position of an object in a beam apparatus which has a processor unit and which is used for processing, imaging and/or analyzing an object. The method has the following steps: (i) providing firstly a predefinable region of an object and secondly a marking in the beam apparatus, wherein the predefinable region has a first position in relation to the marking, and wherein the first position is given by a first distance and a second distance; (ii) rotating the object or rotating a capture device of the beam apparatus; (iii) determining a further second distance; and (iv) determining a second position of the predefinable region of the object in relation to the marking using the first distance, the second distance and the further second distance.