Charged Particle Beam Scanning During Continuous Stage Motion
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Solution Overview
Problem
Current charged particle beam inspection tools face inefficiencies in reviewing large numbers of nuisances on semiconductor substrates, leading to unacceptably long review times due to the sequential nature of defect inspection processes.
Innovation Solution
A charged particle beam apparatus and method that scans preselected locations on a sample surface simultaneously with the sample being moved relative to the beam path, utilizing a charged-particle-optical arrangement to correct aberrations and cover a large field of view, allowing for continuous movement and dynamic aberration correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single beam inspection tool is used to review flagged defects, then measurement precision is maintained, but productivity decreases due to sequentially reviewing millions of nuisances
Solution Approach 1:
The patent segments the inspection process by using multiple independently controllable electron beams instead of a single beam. Each beam can be directed to different regions of the sample simultaneously, dividing the review task into parallel segments that reduce total inspection time while maintaining the precision of individual beam analysis
Solution Approach 2:
The patent merges multiple electron beams into a single inspection system, allowing simultaneous review of multiple defect locations. The multiple beams are combined in the optical system to achieve parallel processing of defect data, improving productivity without sacrificing measurement precision
2Productivity
If the electron beam is scanned over preselected locations while the stage moves continuously, then productivity increases through simultaneous scanning and movement, but device complexity increases due to coordination requirements
Solution Approach 1:
The patent implements dynamic coordination between the beam scanning system and stage movement. The beam deflection and stage positioning are dynamically adjusted in real-time to maintain synchronization, allowing continuous movement while scanning preselected locations. This dynamic control enables productivity improvement without requiring the system to stop or slow down
Solution Approach 2:
The patent employs feedback control mechanisms to coordinate the multiple beams and stage movement. Position feedback from the stage is used to adjust beam deflection in real-time, ensuring that beams remain accurately positioned over preselected defect locations during continuous stage movement, thereby managing device complexity through intelligent control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time required to review samples by enabling simultaneous scanning and aberration correction, thereby efficiently inspecting and verifying defects across a larger area, improving the overall inspection process efficiency.
Implementation Method 1
The interactions between the material structure at the probing spot and the landing electrons from the beam of electrons cause electrons to be emitted from the surface, such as secondary electrons
Implementation Method 2
The interactions between the material structure at the probing spot and the landing electrons from the beam of electrons cause electrons to be emitted from the surface, such as backscattered electrons
Implementation Method 3
The interactions between the material structure at the probing spot and the landing electrons from the beam of electrons cause electrons to be emitted from the surface, such as Auger electrons
Data Source
AI summary
A charged particle beam apparatus for directing a charged particle beam to preselected locations of a sample surface is provided. The charged particle beam has a field of view of the sample surface. A charged-particle-optical arrangement is configured to direct a charged particle beam along a beam path towards the sample surface and to detect charged particles generated in the sample in response to the charged particle beam. A stage is configured to support and move the sample relative to the beam path. A controller is configured to control the charged particle beam apparatus so that the charged particle beam scans over a preselected location of the sample simultaneously with the stage moving the sample relative to the charged-particle-optical column along a route, the scan over the preselected location of the sample covering a part of an area of the field of view.