Particle Beam Shield Positioning for Charging Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing particle beam-based apparatuses for defect inspection and repair in lithography masks face challenges due to uncontrolled beam deflection caused by charging of non-conductive samples, limiting process resolution and requiring complex manual adjustment of shielding elements.
Innovation Solution
An apparatus with a shielding element that shields electric fields using a conductive material, integrated with a detecting unit for automated position adjustment, allowing precise control of the particle beam without breaking vacuum.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a shielding element is arranged close to the sample to minimize charging effects, then beam deflection control and process resolution are improved, but manual adjustment complexity and vacuum breaking requirements increase
Solution Approach 1:
The patent replaces manual mechanical adjustment with an automated electromechanical positioning system. The holder is equipped with a drive mechanism that can be controlled by a control unit, eliminating the need for manual intervention and vacuum breaking. The system uses sensors to detect the position of the shielding element and automatically adjusts it to the optimal position close to the sample.
Solution Approach 2:
The system performs self-adjustment through automated control. The control unit receives position information from sensors and automatically actuates the drive mechanism to position the shielding element optimally, without requiring external manual operation or vacuum breaking. The system serves itself by integrating detection and actuation functions.
2Ease of operation
If manual adjustment of the shielding element is performed by breaking vacuum, then positioning can be achieved, but processing time and operational complexity increase
Solution Approach 1:
The patent replaces manual mechanical adjustment performed outside vacuum with an automated electromechanical positioning system that operates within vacuum. The drive mechanism and control unit enable the shielding element to be positioned automatically without breaking vacuum, eliminating the time-consuming manual adjustment process.
Solution Approach 2:
The system maintains continuous operation within vacuum throughout the adjustment process. The automated positioning mechanism allows the shielding element to be adjusted without breaking vacuum, ensuring continuous useful action and eliminating time losses associated with vacuum breaking and re-establishment.
3Manufacturing precision
If the shielding element is positioned very close to the sample, then beam control and resolution are improved, but beam alignment precision requirements increase
Solution Approach 1:
The patent employs automated electromechanical positioning with integrated sensors to achieve precise positioning of the shielding element. The control unit processes sensor data and automatically adjusts the holder position with high precision, eliminating manual positioning errors and achieving the required alignment accuracy for close-proximity operation.
Solution Approach 2:
The system implements feedback control through sensors that continuously monitor the position of the shielding element and holder. The control unit receives this position information and automatically adjusts the positioning to achieve and maintain the optimal alignment, ensuring high precision beam control even at very close distances to the sample.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-resolution image acquisition and processing with reduced interference, facilitating accurate etching and deposition processes on lithography masks while maintaining vacuum integrity.
Implementation Method 1
a shielding element for shielding an electric field generated by charges accumulated on the sample
Implementation Method 2
uses a beam of charged particles ('particle beam'), in particular an electron beam of an electron microscope, for initiating the chemical processes
Data Source
AI summary
An apparatus for analyzing and/or processing a sample with a particle beam includes a providing unit for providing the particle beam, and a shielding element for shielding an electric field (E) generated by charges (Q) accumulated on the sample. The shielding element has a through opening for the particle beam to pass through towards the sample. The apparatus further includes a detecting unit configured to detect an actual position of the shielding element, and an adjusting unit for adjusting the shielding element from the actual position into a target position.