Charged Particle Beam Shot Correction for Faster Deflection Settling
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Solution Overview
Problem
In electron beam writing devices for semiconductor manufacturing, the settling time of deflector output voltage is critical for precision and throughput, with insufficient time causing errors and excessive time reducing efficiency, necessitating a balance between precision and speed.
Innovation Solution
A charged particle beam writing device that includes a shot data generator, storage for relation information on deflection position shifts, and a shot position corrector to calculate and correct position shifts based on settling time and residual errors across multiple deflection regions, allowing for precise positioning and reduced settling time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the settling time is extended to ensure precision, then writing precision is improved, but throughput decreases
Solution Approach 1:
The system performs preliminary actions by calculating and storing deflection position shift amounts for multiple deflection positions in advance, before actual writing begins. The shot position corrector uses these pre-calculated shift amounts to correct shot positions, allowing the system to achieve high precision without extending the actual settling time during writing operations.
Solution Approach 2:
The system implements feedback by calculating deflection position shift amounts based on the relationship between time elapsed since deflection start and position shifts. The shot position corrector continuously adjusts shot positions using this feedback information, enabling precision maintenance with optimized settling time.
2Productivity
If the settling time is reduced to increase throughput, then productivity is improved, but writing precision deteriorates
Solution Approach 1:
The shot position corrector acts as an intermediary between the deflector and the writing process. It calculates and applies position corrections based on pre-stored shift amount data, mediating the effect of reduced settling time to maintain precision while enabling faster throughput.
Solution Approach 2:
By performing position shift calculations and storing correction data in advance for multiple deflection positions, the system prepares compensation data beforehand. This preliminary action allows the system to use shorter settling times during actual writing while maintaining precision through pre-calculated corrections.
3Manufacturing precision
If the settling time is extended to reduce position shift errors, then manufacturing precision is improved, but loss of time increases
Solution Approach 1:
The system calculates and stores deflection position shift amounts for multiple deflection positions in advance, creating a lookup table of correction data. This preliminary calculation eliminates the need for time-consuming real-time settling, as corrections are applied directly from pre-stored data during writing operations.
Solution Approach 2:
The system replaces the physical settling process with a computational solution. Instead of waiting for the deflector to physically settle, the shot position corrector calculates and applies position corrections based on stored relationship data, substituting mechanical waiting time with computational processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise writing with reduced settling time, enhancing throughput and maintaining high precision by accounting for residual errors in deflection position shifts, thus optimizing the writing process.
Implementation Method 1
a deflector that deflects the charged particle beam
Implementation Method 2
a shot position corrector that obtains a position shift corresponding to an n-th deflection position in sequential pattern writing by using a settling time and a shot time of the deflector and relation information, obtains a position shift corresponding to an n−1-th deflection position, obtains a position correction, and corrects a shot position
Data Source
AI summary
In one embodiment, a charged particle beam writing device writes sequentially patterns to a plurality of deflection positions on a target object by deflecting a charged particle beam by a deflector. The device includes a storage storing relation information indicating a relationship between a time elapsed since a start of deflection by the deflector and an amount of position shift in a shot position to which the charged particle beam is shot, a shot position corrector obtaining a first amount of position shift corresponding to an n-th (where n is an integer greater than or equal to 2) deflection position in sequential pattern writing and a second amount of position shift corresponding to an n−1-th deflection position by using by using a settling time and a shot time of the deflector and the relation information, obtaining an amount of position correction by adding up the first amount of position shift and the second amount of position shift, and correcting a shot position, and a writer emitting the charged particle beam to the n-th deflection position by using the shot data for which the shot position has been corrected, and writing a pattern.