Beam Splitting Optical System for Multiple Exposure
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Solution Overview
Problem
Existing exposure apparatuses for substrates face challenges in reducing costs and size while efficiently performing multiple exposures, often resulting in increased complexity and unnecessary exposure.
Innovation Solution
The exposure apparatus employs a splitting optical system to split a single exposure light beam into multiple beams, which are then used to illuminate different patterns on masks, allowing for efficient multiple exposure of a substrate with a movable blind to control exposure areas and avoid unnecessary exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple light source units and/or multiple illumination systems are provided to perform multiple exposure, then the substrate can be subjected to multiple exposure, but the apparatus cost increases and the apparatus size increases
Solution Approach 1:
The patent merges multiple illumination functions into a single illumination system by using a beam splitting optical system that divides one exposure light beam into multiple beams (first exposure light beam and second exposure light beam). This allows multiple patterns to be illuminated simultaneously with one light source unit, achieving multiple exposure capability while avoiding the need for multiple separate illumination systems and light source units, thus reducing apparatus cost and size.
Solution Approach 2:
The patent segments the exposure light beam into multiple separate beams using a beam splitting optical system. The single exposure light beam is divided into a first exposure light beam for illuminating the first pattern and a second exposure light beam for illuminating the second pattern. This segmentation allows one illumination system to perform multiple illumination functions simultaneously, resolving the contradiction between multiple exposure capability and apparatus complexity.
2Device complexity
If a single illumination system is used to illuminate multiple patterns, then apparatus cost and size are reduced, but control over exposure areas becomes more difficult
Solution Approach 1:
The patent introduces a movable blind as an intermediary component between the illumination system and the substrate. This movable blind can selectively block or transmit light beams and is movable in synchronization with the patterns and substrate. It acts as a mediator that enables precise control over which areas are exposed to which light beams, allowing the single illumination system to accurately control multiple exposure areas without requiring complex additional control mechanisms.
Solution Approach 2:
The patent employs a movable blind that can dynamically adjust its position to control exposure areas. The blind is movable in synchronization with the movement of patterns and substrate, allowing real-time adjustment of which light beams reach which areas. This dynamic control mechanism enables a single illumination system to precisely manage multiple exposure areas throughout the exposure process, maintaining ease of operation despite the simplified apparatus structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces apparatus costs and size while enabling efficient multiple exposure of substrates, ensuring precise control over exposure areas and preventing unnecessary exposure.
Implementation Method 1
a splitting optical system which splits the exposure light beam emitted from the light source unit into a first exposure light beam and a second exposure light beam
Data Source
AI summary
An exposure apparatus includes a light source unit which emits an exposure light beam; and an illumination system which includes a splitting optical system splitting the exposure light beam emitted from the light source unit into a first exposure light beam and a second exposure light beam, and which illuminates a first pattern with the first exposure light beam and illuminates a second pattern with the second exposure light beam; wherein a predetermined area on a substrate is multiply exposed by radiating the first exposure light beam from the first pattern and the second exposure light beam from the second pattern onto the predetermined area on the substrate.