Electron Microscope Beam Tilt Correction for Clearer DPC Imaging

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Solution Overview

Problem

Existing electron microscopes face challenges in obtaining high-quality differential phase contrast images due to geometric aberrations caused by varying the tilt of the electron beam, which results in diffraction contrast variations and image blurring, especially when observing samples with crystallinity and non-uniform thickness.

Innovation Solution

An electron microscope design that includes an illumination deflector assembly positioned ahead of the aberration corrector to vary the tilt of the electron beam, allowing geometric aberrations in the objective lens to be canceled out by the aberration corrector, thereby reducing geometric aberrations and diffraction contrast variations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the tilt of the electron beam is varied by deflecting the beam with a deflector, then the effect of diffraction contrast can be reduced, but geometric aberrations such as astigmatism and coma are produced, causing the image to be blurred

Engineering Contradiction:
Improvediffraction contrast reductionVSAvoidimage quality
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The patent applies preliminary action by correcting geometric aberrations before the electron beam is tilted for diffraction contrast reduction. The aberration corrector is configured to correct geometric aberrations in advance, so that when the beam is subsequently tilted to reduce diffraction contrast, the image quality is maintained. This sequence of operations ensures that both objectives are achieved without compromise.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If the direction of incidence of the electron beam is varied to reduce diffraction contrast, then multiple DPC images can be accumulated, but the beam does not pass through the center of the objective lens, producing geometric aberrations

Engineering Contradiction:
Improvediffraction contrast reductionVSAvoidaberration correction system
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent introduces an aberration corrector as an intermediary component between the electron source and the objective lens. This intermediary device specifically addresses the geometric aberrations caused by off-center beam incidence, allowing the beam to be tilted for diffraction contrast reduction while maintaining image quality through active aberration compensation.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Measurement precision

If the electron beam is tilted relative to the sample, then diffraction contrast varies sensitively, but geometric aberrations cause image blurring

Engineering Contradiction:
Improvediffraction contrast sensitivityVSAvoidimage clarity
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent implements feedback through an aberration correction system that actively compensates for geometric aberrations caused by beam tilting. The system monitors and corrects aberrations in real-time, allowing the electron beam to be tilted at various angles to exploit diffraction contrast sensitivity while maintaining consistent image clarity through continuous aberration management.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the acquisition of high-quality differential phase contrast images by canceling out geometric aberrations and reducing diffraction contrast, resulting in clearer and more accurate imaging of electromagnetic fields within samples.

Implementation Method 1

an electron source for emitting an electron beam

Methodology Applied
Scientific EffectElectron beam: Electron Beam

Implementation Method 2

the geometric aberrations in the objective lens caused by the tilt of the electron beam can be canceled out by the geometric aberrations in the aberration corrector produced by the tilt of the beam

Methodology Applied
Scientific EffectGeometric aberrations:

Implementation Method 3

the visualization of the electromagnetic field is carried out by measuring the amount of deflection of an electron beam caused by the electromagnetic field within the sample

Methodology Applied
Scientific EffectDifferential phase contrast:

Data Source

PatentUS12518944B2Electron microscope and image acquisition method
Publication Date: 2026.01.06 JEOL LTD
  • US12518944B2 patent drawing
  • US12518944B2 patent drawing
  • US12518944B2 patent drawing

AI summary

An electron microscope includes an electron source for emitting an electron beam, an illumination lens for focusing the beam, an aberration corrector for correcting aberrations, an illumination deflector assembly disposed between the illumination lens and the aberration corrector and operating to deflect the beam and to vary its tilt relative to a sample, a scanning deflector for scanning the sample with the beam, an objective lens, a detector for detecting electrons transmitted through the sample and producing an image signal, a control section for controlling the illumination deflector assembly, and an image generating section for receiving the image signal and generating a differential phase contrast (DPC) image. The tilt of the beam is varied by the illumination deflector assembly such that the image generating section generates a plurality of DPC images at different tilt angles of the beam and creates a final image based on the DPC images.