Beam Transmission System for EUV Exposure Polarization Control
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Solution Overview
Problem
Current EUV exposure devices face challenges in achieving high resolving power and controlling the linear polarization direction of illumination light, which affects the contrast of images when fabricating features at 10 nm or smaller, due to the fixed linear polarization direction of optical beams from free electron laser devices.
Innovation Solution
A beam transmission system that includes an optical beam splitting unit and polarization direction rotating units to split and rotate the linear polarization direction of optical beams, allowing for flexible control of the polarization direction of illumination light on the reticle, enabling optimal alignment with the pattern for improved resolving power.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a free electron laser device outputs a linearly polarized optical beam with fixed polarization direction, then the device structure is simple, but the resolving power and image contrast for 10 nm or smaller features cannot be optimized
Solution Approach 1:
The optical beam is divided into multiple beams by the optical beam splitting unit, allowing different polarization directions to be applied to different beams. This segmentation enables optimized illumination for different pattern orientations without requiring complete system redesign.
Solution Approach 2:
Polarization direction rotating units are introduced as intermediary components between the free electron laser device and the reticle. These rotating units act as mediators that can adjust the polarization direction of each beam independently, enabling optimized image contrast without changing the fundamental laser source.
2Manufacturing precision
If the linear polarization direction of the optical beam is fixed, then the device operation is simple, but the image contrast for different pattern orientations cannot be controlled
Solution Approach 1:
The system transitions from a fixed polarization direction to a dynamic configuration where polarization directions can be adjusted. The polarization direction rotating units enable dynamic control of polarization angles to match different pattern orientations on the reticle, improving image contrast adaptability.
Solution Approach 2:
The polarization direction parameter is made variable through the rotating units. By changing the polarization direction parameter to match the pattern orientation, the system optimizes image contrast for different fabrication requirements without altering other system parameters.
3Manufacturing precision
If multiple optical beams with different polarization directions are used, then the resolving power is improved, but the device structure becomes more complex
Solution Approach 1:
The optical beam splitting unit and polarization rotating units serve multiple functions: they divide the beam, rotate polarization directions, and enable adaptive illumination for different pattern types. This multi-functionality reduces the need for separate specialized components for each function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the resolving power of the exposure device by allowing for precise control of the linear polarization direction of illumination light, improving the contrast and quality of images formed on the wafer, particularly for features at 10 nm or smaller.
Implementation Method 1
an optical beam splitting unit configured to split the optical beam into a first optical beam and a second optical beam
Implementation Method 2
a first polarization direction rotating unit configured to rotate a linear polarization direction of the first optical beam
Data Source
AI summary
The present invention allows more freely setting of the polarization direction of illumination light on an illumination surface of an exposure device. A beam transmission system (121) that transmits, to an exposure device (130), a linearly polarized optical beam (L) output from a free electron laser device (10) includes: an optical beam splitting unit (50) configured to split the optical beam (L) into a first optical beam (L1) and a second optical beam (L2); and a first polarization direction rotating unit (51) configured to rotate the linear polarization direction of the first optical beam (L1).