Charged Particle Beam Vacuum Layout for Faster Preprocessing
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Solution Overview
Problem
Current charged particle beam devices face challenges in achieving the required high vacuum for preprocessing, such as ion milling, and require additional vacuum pumps, leading to increased installation costs and longer vacuum exhaust times, especially when the observation and preprocessing chambers are connected via a valve.
Innovation Solution
A charged particle beam device configuration that includes an observation chamber and a preprocessing chamber connected via a gate valve, with a high vacuum pump and a roughing pump, where the caliber of the intake and exhaust ports are optimized to facilitate faster vacuum exhaust, allowing for efficient vacuum control and sample processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a separate vacuum pump is installed for the preprocessing chamber, then the required high vacuum degree for preprocessing can be achieved, but installation cost and device complexity increase
Solution Approach 1:
The single vacuum pump is designed to serve both the observation chamber and preprocessing chamber through a shared vacuum system with controllable valve connections. This multi-functional approach eliminates the need for separate vacuum pumps while maintaining the required vacuum degrees for both chambers during different operational modes.
Solution Approach 2:
The vacuum system merges the observation chamber and preprocessing chamber into a single vacuum management system. By combining the vacuum exhaust paths and using a common vacuum pump with valve control, the system reduces component count while achieving the necessary vacuum conditions for both chambers simultaneously or independently.
2Reliability
If traditional vacuum exhaust methods are used for the preprocessing chamber, then vacuum can be achieved, but the time required to attain the required vacuum degree is excessive
Solution Approach 1:
The vacuum exhaust process is made dynamic through controllable valve operations that adapt the system configuration based on operational needs. The valve control mechanism allows the system to switch between different exhaust paths and configurations, optimizing the vacuum attainment speed for the preprocessing chamber without compromising the observation chamber's vacuum integrity.
Solution Approach 2:
The vacuum system is segmented into controllable sections with independent valve control for each chamber. This segmentation allows the preprocessing chamber to be vacuumed independently or simultaneously with the observation chamber, reducing the time required to achieve the necessary vacuum degree for preprocessing operations.
3Adaptability or versatility
If the observation chamber and preprocessing chamber are connected via a valve, then sample transfer is enabled, but vacuum control complexity increases
Solution Approach 1:
A gate valve serves as an intermediary mechanism between the observation chamber and preprocessing chamber, enabling controlled sample transfer while maintaining vacuum separation when needed. The valve acts as a mediator that allows connectivity for sample exchange but can be closed to preserve independent vacuum conditions in each chamber during preprocessing operations.
4Reliability
If multiple vacuum pumps are installed for separate chambers, then each chamber can be vacuumed independently, but installation space and cost increase
Solution Approach 1:
A single vacuum pump is designed with multi-functional capability to service both the observation chamber and preprocessing chamber through a shared exhaust system with valve control. This eliminates the need for multiple separate vacuum pumps, reducing installation space requirements while maintaining the ability to independently control vacuum conditions in each chamber through valve operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration simplifies the connection between the observation and preprocessing chambers and vacuum pumps, enabling faster vacuum exhaust of the preprocessing chamber, reducing installation costs and time, and improving throughput in semiconductor analysis.
Implementation Method 1
a preprocessing chamber for ion milling, vacuum-exhausted to a predetermined degree of vacuum by a vacuum pump
Data Source
AI summary
A charged particle beam device 1 includes analysis means performed by a controller when a sample holder HL holding a sample SAM is installed on a stage 23. The analysis means includes a step (a) of raising a degree of vacuum of each of an observation chamber 10 and a preprocessing chamber 20 by opening a gate valve VL5, opening a valve VL1, closing a valve VL2, and driving a vacuum pump 40, a step (b) of closing the gate valve VL5 and opening the valve VL2 after the step (a), and a step (c) of processing the sample SAM by radiating an ion beam from an ion source 22 to the sample SAM while performing vacuum exhaust of the preprocessing chamber 20 by the vacuum pump 40 after the step (b). The analysis means can process the sample SAM quickly after performing the vacuum exhaust of the preprocessing chamber 20 in a short time.