Charged Particle Beam Writing Apparatus Mesh Parameter Exchange
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Solution Overview
Problem
The existing charged particle beam writing apparatuses face significant processing time challenges when performing mirror or rotation processing on semiconductor chip data, requiring extensive changes to arrangement coordinates and figure patterns, which prolongs the estimation and execution of writing times due to the need for extensive data processing.
Innovation Solution
The apparatus employs a map generation unit to divide the chip region into mesh areas, allowing for the exchange of parameters defined for each mesh region, thereby reducing processing time by directly corresponding and updating parameters for figure patterns undergoing reversal or rotation processing, and uses a writing unit to write these patterns with a charged particle beam.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If mirror processing or rotation processing is performed on chip data to change arrangement coordinates and figure patterns, then the writing apparatus can accommodate design variations and perform different writing operations, but the processing time becomes extremely long due to the enormous number of cells and figure patterns requiring modification
Solution Approach 1:
The patent divides the chip data into multiple mesh regions (first mesh region, second mesh region, etc.) and processes each region independently. Instead of modifying all cell and figure pattern data throughout the entire chip, the invention segments the processing task by identifying only the affected mesh regions when mirror or rotation processing is requested, thereby dramatically reducing the amount of data that needs to be modified.
Solution Approach 2:
The patent pre-calculates and stores arrangement coordinates and figure pattern data for each mesh region before mirror or rotation processing is needed. When processing is required, the system simply exchanges the pre-stored data between mesh regions rather than performing extensive real-time calculations on all chip data, thus reducing processing time.
2Manufacturing precision
If all cell data and figure pattern data are modified for mirror processing or rotation processing, then the correct writing pattern is achieved, but the estimation of writing time must wait for completion of this extensive data processing
Solution Approach 1:
The patent segments the chip into multiple mesh regions and only processes the specific regions affected by mirror or rotation operations. This allows the system to quickly identify and modify only the necessary portions of the data, maintaining writing accuracy while enabling rapid estimation of total writing time without waiting for complete data processing.
Solution Approach 2:
The patent creates and exchanges copies of arrangement coordinates and figure pattern data between mesh regions when mirror or rotation processing is performed. Instead of modifying the original data extensively, the system generates transformed copies for the affected regions, which maintains data integrity and speeds up the processing required for writing time estimation.
3Ease of operation
If the number of shots and writing time are estimated before writing, then users can plan and schedule writing operations, but the estimation process becomes extremely time-consuming when mirror processing or rotation processing is required
Solution Approach 1:
The patent divides the writing time estimation process into segments corresponding to different mesh regions. When mirror or rotation processing is involved, the system estimates writing time for each affected mesh region independently using pre-calculated data, then sums these estimates. This segmented approach allows rapid preliminary estimation without requiring complete processing of all chip data.
Solution Approach 2:
The patent performs preliminary calculations and stores arrangement coordinates and figure pattern data for each mesh region in advance. This preliminary preparation enables the system to quickly generate writing time estimates by simply exchanging pre-computed data between mesh regions when mirror or rotation operations are requested, rather than performing extensive real-time calculations.
Data Source
AI summary
A charged particle beam writing apparatus includes a map generation unit to generate a map where a parameter concerning a chip is defined for each mesh region obtained by virtually dividing a region including the chip including a plurality of figure patterns into a plurality of mesh regions, an exchange unit to, when performing at least one data processing of reversal and rotation for data of the chip, centering on the center of the chip or the center of the region including the chip, exchange parameters each being the parameter defined for each mesh region in the map, to be corresponding to the position of a figure pattern for which the data processing was performed, and a writing unit to write the figure pattern in the chip for which at least one data processing of reversal and rotation was performed on a target object with a charged particle beam.