Charged Particle Beam Writing Pressure Control for Focus Stability

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Solution Overview

Problem

Conventional charged particle beam writing apparatuses face issues with beam drift due to hydrocarbon contamination and high vacuum gauge deterioration from constant high pressure in the column, which is exacerbated by the gradual decrease in gas generated from components over time.

Innovation Solution

A multi-beam writing apparatus with a control system that adjusts the internal pressure of the vacuum chamber by dynamically changing the target pressure value based on measured values, reducing the high initial pressure to prevent focus deviation and extend the life of the pressure sensor, while maintaining a stable environment for beam adjustment and pattern writing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the amount of ozone gas introduction is gradually increased to maintain column pressure, then the column pressure can be maintained constant, but the pressure sensor deteriorates quickly due to prolonged high pressure state

Engineering Contradiction:
Improvecolumn pressure stabilityVSAvoidpressure sensor lifespan
Core Design Contradiction:
ReliabilityVSDuration of action of stationary object

Solution Approach 1:

The patent applies dynamics by making the target pressure value changeable over time. The control device dynamically adjusts the target pressure value from an initial higher value to a lower value as the apparatus operates. This dynamic adjustment allows the system to maintain adequate pressure for cleaning gas effectiveness initially, then reduces pressure to extend pressure sensor lifespan as the contamination level decreases over time.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent changes the pressure parameter from a constant high value to a time-varying value. The control device modifies the target pressure value based on operational time or contamination accumulation, transitioning from a higher initial pressure (effective for cleaning) to a lower operational pressure (gentle on sensors). This parameter change resolves the contradiction between maintaining cleaning effectiveness and preserving sensor longevity.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If cleaning gas is continuously introduced to remove hydrocarbon contamination, then beam drift can be prevented, but focus deviation occurs due to pressure fluctuation

Engineering Contradiction:
Improvebeam position stabilityVSAvoidbeam focus accuracy
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent implements feedback control where the control device continuously monitors column pressure and adjusts the ozone gas introduction amount accordingly. When pressure deviates from the target value, the system automatically modifies the cleaning gas flow rate to restore pressure stability. This feedback mechanism simultaneously achieves contamination removal and pressure stability, preventing both beam drift and focus deviation.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system performs self-regulation by automatically adjusting cleaning gas introduction based on real-time pressure conditions. The control device monitors the column environment and autonomously modulates the ozone gas flow to maintain optimal pressure, eliminating the need for external intervention and ensuring continuous stable operation without manual pressure adjustments.

Inventive Principle:
Principle #25Self-service

3Reliability

If the column pressure is maintained at a high state to compensate for gas generation from components, then pressure stability can be achieved, but the pressure sensor deteriorates quickly

Engineering Contradiction:
Improvepressure stabilityVSAvoidpressure sensor deterioration
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent employs periodic action by implementing time-based or condition-based pressure adjustment cycles. The system operates in phases: initially maintaining higher pressure to account for significant gas generation from components, then transitioning to lower pressure as the system stabilizes and gas generation decreases. This periodic pressure adjustment pattern maintains stability when needed while reducing sensor stress over time.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The system applies preliminary action by establishing a higher initial target pressure value at the start of operation when component outgassing is most significant. As the apparatus operates and gas generation from components gradually decreases, the target pressure value is reduced. This preliminary high-pressure state ensures stability during the critical initial phase, then transitions to lower pressure to protect the sensor during steady-state operation.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces focus deviation and prolongs the lifespan of the pressure sensor by dynamically adjusting the target pressure, minimizing the high internal pressure state and optimizing cleaning gas supply, thereby ensuring precise beam control and apparatus longevity.

Implementation Method 1

The separated active oxygen and pollution materials are reacted to convert them to carbon monoxide gas which is exhausted, thereby reducing the pollution materials that adhere to electronic optical system components.

Methodology Applied
Scientific EffectOxidation: Oxidation

Implementation Method 2

the ozone introduced into the column and electron beams are brought into collision to separate the ozone into oxygen and active oxygen

Methodology Applied
Scientific EffectPhotodissociation: Photodissociation

Data Source

PatentUS20240412946A1Charged particle beam writing apparatus and charged particle beam writing method
Publication Date: 2024.12.12 NUFLARE TECH INC
  • US20240412946A1 patent drawing
  • US20240412946A1 patent drawing
  • US20240412946A1 patent drawing

AI summary

In one embodiment, an apparatus is for writing a pattern by irradiating a substrate as a writing target in a chamber with a charged particle beam. The apparatus includes a supply device supplying a cleaning gas to the chamber, a vacuum pump discharging a gas from the chamber, a pressure sensor detecting a pressure in the chamber, and a control device obtaining a detection value of the pressure sensor and controlling the supply device so that the pressure in the chamber reaches a first target value. When adjusting the charged particle beam with which the substrate is irradiated, the control device further controls the supply device so that the pressure in the chamber reaches a second target value different from the first target value.