Charged Particle Beam Writing Apparatus Resizing Control
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Solution Overview
Problem
Existing charged particle beam writing techniques face challenges in accurately resizing figure dimensions without causing adjacent figures to either separate or overlap, due to the lack of efficient methods for determining and adjusting contact states during the resizing process.
Innovation Solution
A charged particle beam writing apparatus and method that includes a storage unit for writing data with resizing information, a judgment determination unit to assess resizing needs, and a resize processing unit to adjust figure dimensions based on contact status or resizing direction, ensuring accurate pattern formation without gaps or overlaps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If figure dimensions are resized without considering contact states, then resizing flexibility is improved, but adjacent figures may separate or overlap
Solution Approach 1:
The system performs preliminary analysis of contact states between adjacent figures before resizing. The judgment determination unit evaluates whether figures are in contact with each other in advance, and the resize processing unit uses this information to adjust dimensions while maintaining contact relationships, preventing separation or overlap during the resizing process.
Solution Approach 2:
The system implements a feedback mechanism where the judgment determination unit continuously monitors the contact states between figures during resizing operations. Based on this feedback information about whether figures are contacting or separated, the resize processing unit dynamically adjusts the resizing parameters to maintain proper contact relationships and prevent defects.
2Manufacturing precision
If figure dimensions are precisely controlled to maintain contact states, then pattern accuracy is improved, but resizing capability is restricted
Solution Approach 1:
The system dynamically adjusts resizing parameters based on the contact states of adjacent figures. Rather than using fixed resizing rules, the resize processing unit modifies dimension adjustments in real-time according to feedback from the judgment determination unit, enabling precise control that adapts to different figure configurations and maintains contact states while preserving resizing capability.
Solution Approach 2:
The system applies different resizing strategies to different figures based on their local contact states. The judgment determination unit identifies which figures are in contact with adjacent figures, and the resize processing unit applies localized dimension adjustments only where necessary to maintain contact relationships, allowing other figures to be resized freely without restriction.
3Productivity
If resizing is performed without judgment determination, then processing speed is improved, but figure contact states cannot be maintained
Solution Approach 1:
The system segments the resizing process into distinct functional units: a judgment determination unit that analyzes contact states and a resize processing unit that executes dimension adjustments. This segmentation allows for efficient parallel processing where contact state analysis and resizing calculations can be performed systematically, maintaining precision while optimizing processing speed through structured workflow.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise resizing of figure dimensions within the writing apparatus, maintaining contact states between adjacent figures and preventing issues like spacing or overlap, thus improving the accuracy of pattern writing on semiconductor devices.
Implementation Method 1
The electron beam 330 emitted from a charged particle source 430 and having passed through the opening 411 is deflected by a deflector to pass through a part of the variable-shape opening 421
Implementation Method 2
The electron beam 330 emitted from a charged particle source 430 and having passed through the opening 411 is deflected by a deflector
Data Source
AI summary
A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam.