Charged Particle Beam Writing Apparatus Local Shape Correction
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Solution Overview
Problem
Current charged particle beam writing techniques face challenges in accurately correcting local shape deviations in pattern writing, particularly at finer dimensions, due to interactions like scattering and resist development processes, leading to increased data complexity and processing requirements.
Innovation Solution
A charged particle beam writing apparatus and method that includes detection and correction circuitry to identify shape deviations, generate correction figure data, and convert pattern data into combined-value pixel data for precise dose control, allowing for accurate local corrections without excessive data processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional correction methods are used to correct pattern shape deviations, then correction accuracy is improved, but data amount and processing complexity increase extremely
Solution Approach 1:
The patent segments the figure pattern into multiple small regions (e.g., 3x3 or 5x5 pixel blocks) and performs correction calculations independently for each region. This segmentation allows the system to handle correction data in manageable chunks rather than processing the entire large-scale raster data set at once, thereby reducing overall processing complexity while maintaining correction accuracy.
Solution Approach 2:
The patent applies correction calculations only to specific small regions where shape deviations occur, rather than uniformly processing the entire pattern. By focusing computational resources on partial areas that need correction (determined by region sampling), the system achieves effective correction without the excessive processing burden of comprehensive full-pattern correction.
2Manufacturing precision
If figure pattern is made small to execute minute correction, then correction precision is improved, but data amount increases extremely
Solution Approach 1:
The patent divides the figure pattern into multiple small regions and processes each region separately with its own correction calculation. This segmentation enables high-precision correction at the regional level while keeping the data processing load manageable by handling smaller subsets of data in parallel rather than processing the entire large data set simultaneously.
Solution Approach 2:
The patent introduces a regional dimension to the correction process by organizing correction calculations in a hierarchical structure: the overall figure pattern is divided into multiple small regions, each processed independently. This dimensional organization allows precise local corrections without proportionally increasing total data volume, as the regional structure enables efficient data management and processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-precision correction of pattern shape deviations by effectively managing data and processing complexity, improving accuracy and throughput in charged particle beam writing, especially at finer dimensions.
Implementation Method 1
a writing mechanism configured to write, using a charged particle beam, a pattern on a target object
Implementation Method 2
detection circuitry configured to detect a figure portion whose shape needs to be corrected in the plurality of figure patterns, by interpreting shapes of the plurality of figure patterns
Implementation Method 3
correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting the figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern
Implementation Method 4
combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data
Data Source
AI summary
According to one aspect of the present invention, a charged particle beam writing apparatus includes correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting a figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern; correction figure pattern data conversion circuitry configured to convert the pattern data of the correction figure pattern into correction figure pattern pixel data defining a value corresponding to a dose for the each pixel, based on pixel setting common to that of the writing pattern pixel data; and combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data.