Charged Particle Beam Writing Apparatus Shot Data Generation
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Solution Overview
Problem
Conventional electron beam writing apparatuses face inefficiencies in generating shot data due to complex shot division methods, leading to increased time and reduced throughput, as the number of shots varies between passes and requires extensive arithmetic processing.
Innovation Solution
A charged particle beam writing apparatus and method that divides graphic patterns into shot units and distributes them to subfield areas capable of deflection by the main and sub deflectors, simplifying the shot division process and maintaining consistent shot numbers across passes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If shot division is performed for every pass based on graphics subsequent to subfield area division, then writing accuracy is enhanced through multi-pass writing, but time to generate shot data increases and writing throughput is degraded
Solution Approach 1:
The patent applies preliminary action by performing shot division on the entire graphic pattern before subfield area division, rather than performing shot division separately for each pass after subfield division. This preliminary shot division creates a reusable shot data structure that can be distributed to different subfield areas across multiple passes without requiring repeated shot division arithmetic processing, thus maintaining writing accuracy while significantly reducing data generation time and improving writing throughput.
2Manufacturing precision
If shot division is performed for every pass, then graphics can be accurately written to different subfield areas, but the complexity of shot dividing method increases and arithmetic processing time increases
Solution Approach 1:
The patent performs shot division as a preliminary step before subfield area division, creating a standardized shot data structure that can be reused across multiple passes. This eliminates the need to perform complex shot division arithmetic processing for each pass, reducing both the complexity of the shot dividing method and the associated computational burden while maintaining accurate graphic positioning in different subfield areas.
3Adaptability or versatility
If the number of shots varies between passes, then graphics can be adapted to different subfield area configurations, but the accuracy of estimation of the number of shots is degraded
Solution Approach 1:
The patent performs shot division preliminarily on the entire graphic pattern before subfield area division, establishing a fixed number of shots that remains consistent across all passes. This preliminary shot division enables accurate pre-process estimation of the number of shots while maintaining adaptability to different subfield area configurations through the subsequent distribution of the predetermined shot data to appropriate subfield areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the time needed to generate shot data and enhances writing throughput by simplifying the shot division method and maintaining accurate estimation of shot numbers, while preventing the increase in shots near subfield boundaries.
Implementation Method 1
a main deflector and a sub deflector for deflecting a charged particle beam
Data Source
AI summary
A charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput. A graphic pattern defined in write data is divided into graphics represented in shot units. The divided graphics are temporarily stored in a memory and are distributed to their corresponding subfield areas while developing position information defined in a state of being compressed to write data. When each pattern is written by multi-pass writing, graphics divided at a first pass are used for distribution to subfield areas after a second pass.


