Multiple Charged Particle Beam Writing for Overlap Stripe Accuracy

Solution Overview

Problem

In multiple beam writing, accurately connecting beam arrays for precise application on a substrate is challenging, especially when increasing the number of writing passes, which can lead to position deviations and reduced writing accuracy due to increased stage movement and vibrations.

Innovation Solution

A method and apparatus for multiple charged particle beam writing that involves emitting multiple charged particle beams and performing writing during a stage movement in a reverse direction, to multiple stripe regions partially overlapping in a direction linearly independent of the writing movement, while switching the irradiation region by a deflection amount larger than the beam pitch size, and applying irradiation at each switching.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the number of passes of multiple writing is increased to enhance averaging effect, then writing accuracy is improved, but stage moving distance increases and writing time increases

Engineering Contradiction:

Improvewriting accuracyVSAvoidwriting time

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patent implements periodic switching between two writing directions (first direction and second direction) during the writing process. By alternately writing in opposite directions and utilizing the averaging effect of linear components in both directions, the system achieves improved writing accuracy without requiring multiple passes in the same direction, thereby reducing stage moving distance and writing time.

Inventive Principle:

Principle #19Periodic action

2Manufacturing precision

If the number of passes of multiple writing is increased to enhance averaging effect, then writing accuracy is improved, but stage moving distance increases and vibration increases

Engineering Contradiction:

Improvewriting accuracyVSAvoidvibration

Core Design Contradiction:

Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent implements periodic switching between two writing directions (first direction and second direction) during the writing process. By alternately writing in opposite directions and utilizing the averaging effect of linear components in both directions, the system achieves improved writing accuracy without requiring multiple passes in the same direction, thereby reducing stage moving distance and writing time.

Inventive Principle:

Principle #19Periodic action

3Productivity

If stage speed is doubled to reduce y-direction moving time, then writing time is reduced, but writing accuracy may degrade due to increased vibration

Engineering Contradiction:

Improvewriting timeVSAvoidwriting accuracy

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The patent implements periodic switching between two writing directions (first direction and second direction) during the writing process. By alternately writing in opposite directions and utilizing the averaging effect of linear components in both directions, the system achieves improved writing accuracy without requiring multiple passes in the same direction, thereby reducing stage moving distance and writing time.

Inventive Principle:

Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces position deviations due to linear component displacement in the beam array shape, while maintaining the writing accuracy and suppressing the increase in stage moving distance, thus enhancing the overall writing efficiency.

Implementation Method 1

repeatedly switching an irradiation region, in the first direction, by a deflection amount having a width larger than a beam pitch size of the multiple charged particle beams

Methodology Applied

Scientific EffectBeam deflection: Lorentz Force

Implementation Method 2

performing writing with the multiple charged particle beams, during a movement of a stage having a target object thereon in a reverse direction to a movement direction of the writing

Methodology Applied

Scientific EffectMechanical movement:

Data Source

PatentUS20250140521A1Multiple charged particle beam writing method and multiple charged particle beam writing apparatus

Publication Date: 2025.05.01 NUFLARE TECH INC

AI summary

A multiple charged particle beam writing method includes emitting multiple charged particle beams, and performing writing with the multiple charged particle beams, during a movement of a stage having a target object thereon in a reverse direction to a movement direction of the writing, to at least two stripe regions in a plurality of stripe regions aligned, on the target object, partially overlapping with each other in the first direction being linearly independent with respect to the movement direction of the writing, while repeatedly switching an irradiation region, in the first direction, by a deflection amount having a width larger than a beam pitch size of the multiple charged particle beams, and applying irradiation with the multiple charged particle beams at each time of the switching the irradiation region.