Charged Particle Beam Writing Substrate Cover Position Correction
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Solution Overview
Problem
In charged particle beam writing apparatuses, positional deviations of substrate covers during attachment and detachment can lead to scratching of the substrate and increased particle generation due to the need for additional contact points and alignment mechanisms, which accumulate errors and increase the risk of particle contamination.
Innovation Solution
A charged particle beam writing apparatus and method that includes a substrate cover attachment/detachment unit, a position measurement unit, and a correction unit to accurately measure and correct positional deviations of the substrate cover before and after writing, thereby preventing scratching and particle generation by ensuring precise alignment and minimizing contact points.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a substrate cover is attached to the substrate to prevent charging by reflected electrons, then the substrate is protected from charging, but positional deviation occurs during attachment and detachment which can scratch the substrate
Solution Approach 1:
The patent measures the position of the substrate cover before attachment and after detachment in advance, and performs position correction based on the measured deviation. This preliminary measurement and correction action prevents the substrate cover from scratching the substrate during subsequent attachment and detachment operations.
2Measurement precision
If separate support tables are provided for supporting and aligning the substrate cover, then alignment precision is improved, but the number of contact points increases which generates more particles
Solution Approach 1:
The patent combines the support table for holding the substrate cover and the alignment function into a single integrated support table. The support table includes positioning pins that simultaneously provide mechanical support and alignment, eliminating the need for separate support and alignment mechanisms, thereby reducing contact points and particle generation while maintaining alignment precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively inhibits scratching of the substrate and reduces particle generation by ensuring accurate positional correction of the substrate cover, maintaining the integrity of the substrate and reducing contamination risks during the writing process.
Implementation Method 1
a position measurement unit, before and after performing writing by the writing unit, to measure a position of the substrate cover
Implementation Method 2
a correction unit, with respect to a position of the substrate to which the substrate cover has been attached, to correct a positional deviation amount
Data Source
AI summary
A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.