Ion Implanter Beamline Scattering Members for Neutron Dose Control
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Solution Overview
Problem
In semiconductor manufacturing, ultrahigh energy ion implanters face challenges in effectively monitoring and reducing neutron radiation levels without increasing costs, as existing methods require extensive shielding and labor-intensive door operations, which hinder production efficiency.
Innovation Solution
An ion implanter design incorporating neutron ray scattering members strategically positioned along the beamline to manage neutron dose rates, using materials with high scattering effects like hydrogen or boron, and employing a control system to monitor neutron levels with reduced instrumentation, thereby minimizing external neutron exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If extensive shielding is used to reduce neutron radiation levels, then neutron dose rates outside the implanter are suppressed, but device complexity and cost increase
Solution Approach 1:
The patent introduces neutron ray scattering members as intermediary elements positioned between the ion beam path and the external environment. These scattering members (made of hydrogen-rich or boron-containing materials) intercept and scatter neutron rays before they can escape the implanter, effectively reducing external neutron dose rates without requiring extensive traditional shielding structures
Solution Approach 2:
The patent extracts the neutron radiation control function from the traditional extensive shielding approach and concentrates it into specific scattering members positioned at critical locations along the beamline. By removing unnecessary shielding components and focusing neutron scattering functionality where it is most needed, the overall device complexity is reduced while maintaining effective neutron dose rate suppression
2Object-affected harmful factors
If traditional shielding methods are used, then neutron radiation is reduced, but production efficiency decreases due to labor-intensive door operations
Solution Approach 1:
The patent replaces the mechanical door operation system with a passive neutron scattering field. Instead of using movable doors that require labor-intensive opening and closing operations, the invention uses stationary neutron ray scattering members that continuously provide neutron radiation control without mechanical intervention, thereby eliminating the trade-off between radiation protection and production efficiency
3Object-affected harmful factors
If neutron ray measuring instruments are deployed to monitor neutron levels, then radiation safety is improved, but device complexity and cost increase
Solution Approach 1:
The patent implements a self-service monitoring approach where the neutron ray measuring instruments are automatically positioned and operated by the control device based on real-time beam conditions. The system self-adjusts the number and positions of measuring instruments according to the ion beam energy and intensity, eliminating the need for fixed extensive monitoring infrastructure while maintaining radiation safety
Solution Approach 2:
The patent introduces dynamic adaptability in the monitoring system by allowing the control device to adjust the deployment and operation of neutron ray measuring instruments based on changing beam conditions. This dynamic approach enables effective radiation monitoring with minimized instrumentation, as instruments are only activated and positioned when and where needed rather than being permanently deployed throughout the facility
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively suppresses neutron dose rates outside the implanter to safe levels, reducing the need for extensive shielding and lowering costs while maintaining production efficiency by optimizing neutron ray scattering and monitoring.
Implementation Method 1
a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure neutron rays which can be generated at a plurality of locations of the beamline due to collision of a high-energy ion beam
Implementation Method 2
using materials with high scattering effects like hydrogen or boron
Data Source
AI summary
An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure a neutron ray from a neutron ray source which is generated in the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a plurality of measurement values measured by the plurality of neutron ray measuring instruments.