Beta-Phase Alumina Remote Plasma System for Semiconductor Etching
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Solution Overview
Problem
The use of plasma in semiconductor manufacturing processes, such as deposition and etching, while enhancing efficiency, poses challenges that need to be addressed to improve process efficiency and reduce maintenance costs and downtime.
Innovation Solution
A remote plasma system utilizing a plasma block made of beta-phase aluminum oxide, which generates plasma for deposition and etching processes, minimizing plasma pollution and maintaining process reliability, and includes a dual-zone showerhead for even precursor distribution and a control unit for precise process control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If plasma is used in deposition and etching processes, then process efficiency is enhanced, but plasma pollution increases and maintenance needs increase
Solution Approach 1:
The plasma generation system is segmented into a remote plasma source separated from the reaction chamber. The plasma is generated in a plasma generation chamber and then transported to the reaction chamber, dividing the plasma generation function from the deposition/etching function to reduce plasma pollution in the reaction chamber
Solution Approach 2:
A plasma transfer chamber with differential pumping acts as an intermediary between the plasma generation chamber and the reaction chamber. This intermediary system allows plasma to be transported while maintaining pressure differential, preventing plasma pollution from directly contaminating the reaction chamber
2Productivity
If plasma is used in deposition and etching processes, then process efficiency is enhanced, but maintenance costs and downtime increase
Solution Approach 1:
The system is divided into separate chambers: plasma generation chamber, plasma transfer chamber, and reaction chamber. This segmentation isolates the plasma generation components from the reaction chamber, reducing contamination and maintenance needs in the reaction chamber
Solution Approach 2:
The plasma generation source is extracted from the reaction chamber and placed in a separate remote chamber. This extraction removes the harmful plasma generation effects from the reaction environment while maintaining the beneficial plasma effects for deposition and etching
3Quantity of substance
If conventional plasma generation is used, then plasma is generated for deposition and etching, but plasma distribution uniformity decreases
Solution Approach 1:
The showerhead design incorporates multiple zones (dual-zone showerhead) that distribute plasma and precursors in a controlled manner across different spatial dimensions, improving uniformity of precursor distribution over the substrate surface
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The remote plasma system enhances process efficiency, reduces maintenance needs, and improves yield by maintaining a cleaner plasma generation process, leading to a broader processing window and lower operational costs.
Implementation Method 1
A remote plasma system utilizing a plasma block made of beta-phase aluminum oxide, which generates plasma for deposition and etching processes
Data Source
AI summary
A system and method for generating and using plasma is provided. An embodiment comprises a plasma generating unit that comprises beta-phase aluminum oxide. A precursor material is introduced to the plasma generating unit and a plasma is induced from the precursor material. The plasma may be used to deposit or etch materials on a semiconductor substrate.