Bi-Oxide Sputtering Target for Magnetic Particle Separation
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Solution Overview
Problem
The existing sputtering targets with metal oxides like SiO2, TiO2, and B2O3 added to Pt, Cr, or Ru result in insufficient separateness of magnetic particles, limiting further improvements in recording density for perpendicular magnetic recording media.
Innovation Solution
A sputtering target with 0.05 at % or more Bi and a total metal oxide content of 10 vol % to 60 vol %, balanced with Co and Pt, is used to control saturation magnetization, magnetic anisotropy, and crystal orientation, while improving particle separateness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If metal oxides such as SiO2, TiO2, and B2O3 are added to Pt, Cr, or Ru to form a sputtering target, then saturation magnetization and vertical magnetic anisotropy can be controlled while maintaining good crystal orientation, but the separateness of magnetic particles becomes insufficient
Solution Approach 1:
The invention changes the chemical composition parameters of the sputtering target by adding specific metal oxides (SiO2, TiO2, B2O3) to the Pt-Cr-Ru system. This compositional modification enables simultaneous control of saturation magnetization, vertical magnetic anisotropy, and magnetic particle separateness, resolving the contradiction between maintaining crystal orientation and improving particle separateness
Solution Approach 2:
The invention creates a composite sputtering target material combining Pt, Cr, Ru, and metal oxides (SiO2, TiO2, B2O3) in specific proportions. This composite material system achieves both good crystal orientation and sufficient magnetic particle separateness, which cannot be achieved with single-component or simple binary systems
2Quantity of substance
If the separateness of magnetic particles is improved to increase recording density, then recording density can be increased, but saturation magnetization and magnetic anisotropy control becomes more difficult
Solution Approach 1:
The invention modifies the compositional parameters of the sputtering target by incorporating metal oxides (SiO2, TiO2, B2O3) alongside Pt, Cr, and Ru. This parameter change enables independent control of particle separateness and magnetic properties (saturation magnetization and magnetic anisotropy), allowing both to be optimized simultaneously for high recording density
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach suppresses particle growth, enhances particle size dispersion, and maintains crystal orientation, leading to improved separateness and uniformity of magnetic particles in the recording medium.
Implementation Method 1
Each of these layers is sputtered on a substrate using a sputtering target corresponding to each layer to form each film sequentially
Data Source
AI summary
Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.