Bi-section Semiconductor Laser Electrode Separation

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing methods for manufacturing bi-section semiconductor laser devices face challenges such as misalignment and increased contact resistance, leading to higher operating voltages and degraded electrical and optical characteristics, particularly when forming a ridge structure and separating electrodes.

Innovation Solution

The method involves forming a stacked structure with a belt-shaped second electrode, using wet etching to separate it into distinct portions, and employing a resist layer to create a separating groove, ensuring accurate alignment and reducing contact resistance by using high electrical resistance between electrode portions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If dry etching is used to separate the second electrode into first and second portions, then the electrode separation is achieved, but misalignment between the second electrode and ridge structure occurs and oxidation films and impurities are left between the second compound semiconductor layer and the first metal film, increasing contact resistance and operating voltage

Engineering Contradiction:
Improvealignment accuracy between second electrode and ridge structureVSAvoidcontact resistance between compound semiconductor layer and metal film
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent replaces dry etching (mechanical/physical process) with wet etching (chemical process) to form the separating groove in the second electrode. This substitution eliminates the harmful effects of dry etching such as misalignment and oxidation film formation, while achieving the desired electrode separation. The wet etching process using specific etchants selectively removes metal without damaging the underlying semiconductor layers or creating oxidation films.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the etching method parameter from dry to wet etching, and selects specific etchants (such as aqua regia or mixed acids) to achieve selective removal of the metal film. By controlling etching parameters including etchant composition, temperature, and time, the process achieves precise groove formation without creating harmful byproducts or increasing contact resistance.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If the second electrode is formed as a continuous belt-shaped structure, then the manufacturing process is simplified, but the operating voltage increases due to high contact resistance between the electrode and compound semiconductor layer

Engineering Contradiction:
Improveprocess simplicity for forming second electrodeVSAvoidcontact resistance between second electrode and second compound semiconductor layer
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent segments the continuous belt-shaped second electrode into a first portion and a second portion by forming a separating groove between them. This segmentation reduces the contact resistance by creating separate contact regions that can be optimized independently, while still maintaining the overall belt-shaped configuration for ease of manufacture. The groove acts as an electrical isolator between the two portions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces an intermediary structure (separating groove) filled with insulating material or air gap between the first and second portions of the second electrode. This intermediary element serves as both an electrical isolator to reduce contact resistance and a structural feature that maintains the belt-shaped configuration during manufacturing.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Power

If the second electrode is separated into first and second portions with high electrical resistance between them, then self-pulsation operation with high peak power is enabled, but the manufacturing complexity increases due to the need for precise groove formation

Engineering Contradiction:
Improvepeak power of self-pulsation operationVSAvoidcomplexity of groove formation process
Core Design Contradiction:
PowerVSDevice complexity

Solution Approach 1:

The patent replaces complex dry etching processes with simpler wet etching methods to form the separating groove. The wet etching process using chemically selective etchants achieves precise groove formation without requiring complex equipment or multiple processing steps, thereby reducing manufacturing complexity while enabling the high electrical resistance needed for self-pulsation operation.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent optimizes etching parameters including etchant selection, concentration, temperature, and etching time to achieve the desired groove depth and width that provide sufficient electrical isolation. By carefully controlling these parameters, the process achieves the required high resistance between electrode portions without increasing manufacturing complexity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for accurate formation of the ridge structure and electrodes, reducing contact resistance and operating voltage, enabling self-pulsation operation with high peak power and efficient optical pulse generation.

Implementation Method 1

forming a ridge structure by etching at least part of the second compound semiconductor layer using the second electrode as an etching mask

Methodology Applied
Scientific EffectWet etching:

Implementation Method 2

The electrical resistance between the first portion and the second portion of the second electrode is 10 times or more that between the second electrode and the first electrode

Methodology Applied
Scientific EffectElectrical resistance: Electrical Resistance

Implementation Method 3

supplying a direct current from the first portion of the second electrode to the first electrode through the light-emitting region

Methodology Applied
Scientific EffectElectroluminescence: Electroluminescence

Implementation Method 4

applying an electric field to the saturable absorption region

Methodology Applied
Scientific EffectSaturable absorption: Absorption (EM radiation)

Data Source

PatentUS8329483B2Bi-section semiconductor laser device, method for manufacturing the same, and method for driving the same
Publication Date: 2012.12.11 SONY GROUP CORP
  • US8329483B2 patent drawing
  • US8329483B2 patent drawing
  • US8329483B2 patent drawing

AI summary

A method for manufacturing a bi-section semiconductor laser device includes the steps of (A) forming a stacked structure obtained by stacking, on a substrate in sequence, a first compound semiconductor layer of a first conductivity type, a compound semiconductor layer that constitutes a light-emitting region and a saturable absorption region, and a second compound semiconductor layer of a second conductivity type; (B) forming a belt-shaped second electrode on the second compound semiconductor layer; (C) forming a ridge structure by etching at least part of the second compound semiconductor layer using the second electrode as an etching mask; and (D) forming a resist layer for forming a separating groove in the second electrode and then forming the separating groove in the second electrode by wet etching so that the separating groove separates the second electrode into a first portion and a second portion.