BIB Sample Pre-Alignment Using Matched Masks for Faster Throughput

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Solution Overview

Problem

Broad Ion Beam (BIB) polishing systems face inefficiencies due to the time-consuming and skill-intensive alignment process and increased redeposition of sample material, leading to reduced workflow efficiency and downtime, limiting their use mainly to academic and non-commercial applications.

Innovation Solution

The system employs a pre-alignment method using a first mask outside the BIB system and a second mask within the system, allowing for efficient processing of multiple samples by maintaining a desired geometric relationship, and includes a dual BIB source configuration to minimize downtime during maintenance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If samples are precisely aligned with masks inside the BIB system, then processing accuracy is improved, but alignment time and workflow efficiency deteriorate

Engineering Contradiction:
Improvealignment precisionVSAvoidalignment time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent applies preliminary action by pre-aligning samples with a first mask outside the BIB system before processing. This pre-alignment step is performed in advance, allowing samples to be positioned correctly before entering the main processing system, thereby eliminating time-consuming alignment operations inside the BIB system while maintaining processing accuracy.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses an intermediary approach by introducing a first mask as a preliminary alignment tool that is geometrically similar to the second mask inside the BIB system. This first mask serves as a mediator that enables pre-alignment outside the system, allowing samples to be prepared in advance without requiring precise alignment equipment inside the BIB system.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If higher current broad ion beam is used to remove sample material more rapidly, then processing speed is improved, but redeposition rate increases causing more frequent source cleaning and system downtime

Engineering Contradiction:
Improvematerial removal rateVSAvoidsource cleaning frequency
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The patent extracts the alignment function from the main BIB processing system by using a separate first mask outside the system. This separation allows the high-current ion beam to be used at full power for material removal without the need to reduce current for precise alignment operations, thereby maintaining high productivity while reducing redeposition-related downtime through efficient pre-alignment.

Inventive Principle:
Principle #2Taking out (Extraction)

3Adaptability or versatility

If traditional BIB polishing systems are used for commercial applications, then sample processing capability is provided, but workflow efficiency and system uptime are insufficient

Engineering Contradiction:
Improvesample processing capabilityVSAvoidworkflow efficiency
Core Design Contradiction:
Adaptability or versatilityVSProductivity

Solution Approach 1:

The patent enables commercial-grade productivity by implementing preliminary action through pre-alignment of multiple samples outside the BIB system. By preparing samples in advance with the first mask, the system can process multiple samples continuously without interruption for alignment, achieving high workflow efficiency and system uptime suitable for commercial applications.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent achieves continuity of useful action by eliminating downtime between samples through pre-alignment. Multiple samples are prepared in advance and can be processed in sequence without interrupting the ion beam for alignment operations, maintaining continuous productive operation that meets commercial application requirements.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables faster and more accurate processing of multiple samples, significantly increasing system uptime and reducing downtime for maintenance, thus enhancing the overall efficiency and usability of BIB systems for commercial applications.

Implementation Method 1

BIB polishing systems directing a high energy, unfocused or minimally focused beams of ions (e.g., Argon ions) at a sample, where the beam degrades and/or otherwise removes the portions of the sample upon which it is incident

Methodology Applied
Scientific EffectIon Beam: Ion Beam

Implementation Method 2

samples being processed need to be precisely aligned with special masks that are designed to block portions of the beam from being incident on regions of the sample that users do not desire to be removed

Methodology Applied
Scientific EffectPhysical Barrier:

Data Source

PatentUS12106931B2Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a Broad Ion Beam (BIB) system
Publication Date: 2024.10.01 FEI CO
  • US12106931B2 patent drawing
  • US12106931B2 patent drawing
  • US12106931B2 patent drawing

AI summary

Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a BIB system according to the present invention comprises affixing a sample to an adjustable portion of a sample holder, nesting the sample holder with a first mask having a first mask edge, wherein the first mask is positioned outside of a BIB system, and aligning the sample such that it has a desired geometric relationship to the first mask edge. The first mask may be geometrically similar with a second mask within the BIB system that has a second mask edge such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask.