Bidirectional ESD Protection Device Using Merged PNP Transistors

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Solution Overview

Problem

Existing ESD protection devices are unidirectional, which limits their effectiveness in managing electrostatic discharge (ESD) events and can lead to current crowding issues, compromising the robustness of CMOS IC products in nanoscale processes.

Innovation Solution

A bidirectional ESD protection device is designed with a heavily-doped semiconductor substrate, epitaxial layers, and doped areas of specific conductivity types, where the lightly-doped area surrounds the heavily-doped area to suppress current crowding and enhance ESD robustness, utilizing a vertical bipolar junction transistor structure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If a unidirectional PNP bipolar junction transistor is used for ESD protection, then the device size is reduced, but the ESD robustness is compromised due to unidirectional operation

Engineering Contradiction:
Improvedevice sizeVSAvoidESD robustness
Core Design Contradiction:
Volume of moving objectVSReliability

Solution Approach 1:

The patent combines two PNP bipolar junction transistors into a single integrated structure where the first PNP transistor has its collector connected to the emitter of the second PNP transistor. This merging creates a bidirectional ESD protection device that maintains compact size while achieving protection in both voltage polarity directions through the coordinated operation of the two transistors

Inventive Principle:
Principle #5Merging (Combining)

2Area of stationary object

If a compact ESD protection device is implemented, then surface area is reduced, but current crowding effect increases

Engineering Contradiction:
Improvesurface areaVSAvoidcurrent crowding effect
Core Design Contradiction:
Area of stationary objectVSObject-generated harmful factors

Solution Approach 1:

The patent introduces a lightly-doped area with a specific doping concentration lower than the heavily-doped area, strategically positioned to cover the corner of the heavily-doped area. This local modification of doping quality redistributes the current density in the compact device structure, suppressing the current crowding effect at critical regions while maintaining the overall compact footprint

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The bidirectional ESD protection device effectively manages ESD events by providing a robust and efficient discharge path, reducing the risk of current crowding and improving the reliability of CMOS IC products.

Implementation Method 1

The ESD protection device would be triggered immediately when the ESD event occurs. In that way, the ESD protection device can provide a superiorly low resistance path for discharging the transient ESD current, so that the energy of the ESD transient current can be bypassed by the ESD protection device

Methodology Applied
Scientific EffectElectrostatic Discharge: Electrostatic Discharge

Implementation Method 2

The lightly-doped area surrounds the heavily-doped area and covers the corner of the heavily-doped area... suppress the current crowding effect and improve the ESD robustness

Methodology Applied
Scientific EffectElectrical Conduction: Conduction (electrical)

Data Source

PatentUS11349017B2Bidirectional electrostatic discharge (ESD) protection device
Publication Date: 2022.05.31 AMAZING MICROELECTRONICS
  • US11349017B2 patent drawing
  • US11349017B2 patent drawing
  • US11349017B2 patent drawing

AI summary

A bidirectional electrostatic discharge protection device and a method for fabricating the same is disclosed. The protection device includes a heavily-doped semiconductor substrate, a first semiconductor epitaxial layer, a second semiconductor epitaxial layer, a heavily-doped area, and a lightly-doped area. The substrate, the heavily-doped area, and the lightly-doped area have a first conductivity type and the epitaxial layers have a second conductivity type. The first semiconductor epitaxial layer and the second semiconductor epitaxial layer are sequentially formed on the substrate, and the heavily-doped area and the lightly-doped area are formed in the second semiconductor epitaxial layer. The lightly-doped area covers the corner of the heavily-doped area, and the breakdown voltage of a junction between the heavily-doped semiconductor substrate and the first semiconductor epitaxial layer corresponds to the breakdown voltage of a junction between the second semiconductor epitaxial layer and the heavily-doped area.