Binary Mask Opening Geometry for LCD Spacer Height Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional methods for manufacturing spacers, such as gray tone and halftone masks, face high manufacturing costs and complexity in pattern design, making it difficult to produce spacers of different heights efficiently.
Innovation Solution
A binary mask with specific opening regions of varying geometric shapes, where the ratio of the length to the width or long axis to the short axis is greater than or equal to 1.25, is used to create spacers of different heights, allowing for easier control and reduced production costs by adjusting the width or length of the openings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If gray tone mask or halftone mask is used to manufacture spacers of different heights, then spacers of different heights can be produced, but manufacturing cost increases and pattern designing becomes difficult
Solution Approach 1:
The patent changes the parameter of opening size (area) in the binary mask to control exposure energy. By using openings of different sizes rather than different gray levels or halftone patterns, the manufacturing process becomes simpler and more cost-effective while still achieving different spacer heights. The exposure energy is directly proportional to the opening area, providing a linear and predictable relationship for spacer height control.
2Manufacturing precision
If gray tone mask or halftone mask is used to manufacture spacers of different heights, then spacers of different heights can be produced, but manufacturing complexity increases
Solution Approach 1:
The patent segments the mask into distinct binary opening regions with different areas. Instead of using continuous gray level variations or complex halftone patterns, the mask is divided into discrete opening regions (first opening region, second opening region, etc.) each with a specific area that corresponds to a desired spacer height. This segmentation simplifies the mask structure while maintaining the ability to produce spacers of different heights.
3Ease of manufacture
If binary mask with different opening areas is used, then manufacturing cost is reduced and process is simplified, but control over spacer height precision must be maintained
Solution Approach 1:
The patent applies local quality by making each opening region have a specific area tailored to produce a particular spacer height. The first opening region has a different area than the second opening region, creating local variations in exposure energy that result in different spacer heights. This localized control of opening area ensures precise spacer height control while maintaining the overall simplicity of the binary mask structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves good uniformity and reproducibility in spacer heights, reducing manufacturing costs and simplifying the process compared to conventional methods, while allowing for precise adjustment of spacer heights through the binary mask design.
Implementation Method 1
The gray tone mask reduces effective exposure energy by means of the diffraction phenomenon generated by light when passing through an opening (or a slit)
Implementation Method 2
The halftone mask controls the intensity proportion of transmission light by means of the thickness of a chromium film coated on a pattern
Data Source
AI summary
A mask, a corresponding spacer structure and a liquid crystal display panel using the same are provided. The mask includes a first opening region and a second opening region. The first opening region and the second opening region respectively have geometric shapes with the ratio of the length to the width or the ratio of the long axis to the short axis being greater than or equal to 1.25, and the area of the first opening region is greater than the area of the second opening region.