Biometric Chip Dynamic Exposure Adaptation

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Solution Overview

Problem

Biometric characteristic acquisition chips, such as under-screen fingerprint acquisition chips, face accuracy issues due to poor adaptability to environmental changes, leading to reduced accuracy in biometric recognition and registration.

Innovation Solution

A method that dynamically adjusts the exposure duration based on current environmental conditions by determining a second exposure duration using a local region's photosensitive value and a preset relationship, improving adaptability and accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a default exposure duration is set for biometric characteristic acquisition chip during calibration phase, then the chip can perform basic biometric image acquisition, but the adaptability to environmental changes deteriorates

Engineering Contradiction:
Improveadaptability to environmental changesVSAvoidaccuracy of biometric image
Core Design Contradiction:
Adaptability or versatilityVSMeasurement precision

Solution Approach 1:

The patent implements dynamic exposure duration adjustment by introducing an environmental adaptation mechanism. The chip dynamically modifies the exposure duration parameter based on real-time environmental conditions (lighting, temperature, humidity) rather than using a fixed default value. This dynamic adjustment resolves the contradiction by allowing the system to adapt to changing environments while maintaining optimal image acquisition accuracy.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent changes the exposure duration parameter from a static default value to a dynamically adjustable parameter. By monitoring environmental conditions and adjusting the exposure duration accordingly, the system optimizes the photosensitive value for different environments. This parameter change enables the chip to maintain high measurement precision across varying environmental conditions.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If local exposure is performed on a first region to determine photosensitive value, then the speed of biometric image acquisition is improved, but the coverage area is reduced

Engineering Contradiction:
Improvespeed of biometric image acquisitionVSAvoidphotosensitive region coverage
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The patent divides the photosensitive region into a first region (local area for rapid exposure testing) and a second region (remaining area for full coverage). By performing exposure operations on the smaller first region to determine the photosensitive value, the system achieves faster acquisition speed. The segmentation allows the critical parameter measurement to be completed quickly while the remaining second region maintains full coverage for complete biometric image capture.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies partial action by performing exposure operations only on a portion of the photosensitive region (the first region) rather than the entire area. This partial exposure approach is sufficient to determine the photosensitive value needed for configuring the remaining second region, thereby reducing the total exposure time while maintaining adequate coverage for accurate biometric image acquisition.

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances the accuracy and speed of biometric image acquisition, thereby improving the accuracy rate of subsequent biometric recognition and registration by adapting to environmental changes.

Implementation Method 1

a local region (i.e., the first region) in the photosensitive region of the chip for biometric characteristic acquisition is locally exposed according to the first exposure duration

Methodology Applied
Scientific EffectPhotoelectric Effect: Photoelectric Effect

Data Source

PatentEP4120124B1Biometric collection method and chip, and computer-readable storage medium
Publication Date: 2024.02.21 SHENZHEN GOODIX TECH CO LTD
  • EP4120124B1 patent drawingFigure 1
  • EP4120124B1 patent drawingFigure 2~3
  • EP4120124B1 patent drawingFigure 4~6

AI summary

Some embodiments of the present disclosure relate to biometric characteristic detection technology, which provide a method and chip for biometric characteristic acquisition, and a computer readable storage medium. The method for biometric characteristic acquisition includes: acquiring a plurality of configuration parameters (201), where the plurality of configuration parameters include a first exposure duration, a first region and a target photosensitive value, where the first region is a local region in a photosensitive region of the chip for biometric characteristic acquisition; exposing the first region according to the first exposure duration, and acquiring a photosensitive value of the first region (202); determining a second exposure duration required to acquire the target photosensitive value in the photosensitive region according to the photosensitive value of the first region and the first exposure duration (203); and acquiring a biometric image according to the second exposure duration (204).