Bipolar Transistor Base Horizontal Displacement
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Solution Overview
Problem
Conventional bipolar transistors have higher base-to-collector capacitance due to vertical overlap between the base and collector, which is undesirable in certain technical applications and limits the miniaturization of structural features and microelectronic devices.
Innovation Solution
A bipolar transistor structure is designed with a base that is horizontally displaced from the collector, utilizing trench isolation to separate the base and collector, thereby reducing capacitance and allowing for a more compact design without sacrificing functionality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional approaches form an extrinsic base linked to an intrinsic base via conventional epitaxy, then the bipolar transistor can be formed with standard fabrication processes, but portions of the collector and extrinsic base vertically overlap causing higher base-to-collector capacitance
Solution Approach 1:
The patent applies dimensionality change by transitioning from vertical stacking to horizontal displacement. The extrinsic base is positioned horizontally adjacent to the collector rather than vertically overlapping it, eliminating the capacitance issue while maintaining electrical connectivity through the semiconductor substrate.
Solution Approach 2:
The patent introduces an intermediary structure (the semiconductor substrate acting as a common base region) that electrically connects the extrinsic base and collector without requiring direct vertical contact. This intermediary approach allows electrical functionality while preventing capacitive coupling.
2Device complexity
If the base and collector are vertically overlapped to simplify structure, then fabrication is easier, but the capacitance increases which is undesirable in certain technical applications
Solution Approach 1:
The patent resolves the contradiction by changing the spatial arrangement from vertical (one dimension) to horizontal (another dimension). The extrinsic base extends horizontally from the intrinsic base region, placing it adjacent to rather than overlapping the collector, thus reducing capacitance while maintaining structural simplicity.
3Volume of moving object
If device size is reduced to increase device density, then chip size decreases, but base-to-collector capacitance increases due to closer proximity
Solution Approach 1:
The patent enables miniaturization by utilizing horizontal space instead of vertical overlap. The extrinsic base is displaced horizontally, allowing the device footprint to be reduced in the vertical dimension while maintaining adequate separation from the collector to minimize capacitance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The horizontal displacement of the base from the collector reduces base-to-collector capacitance and allows for a smaller footprint, enhancing operational reliability and enabling higher device densities and smaller chip sizes while maintaining performance.
Implementation Method 1
the TI is vertically between the sub-collector and the second portion of the base to define a capacitive coupling between the sub-collector and the second portion of the base
Data Source
AI summary
Aspects of the disclosure provide a bipolar transistor structure with a sub-collector on a substrate, a first collector region on a first portion of the sub-collector, a trench isolation (TI) on a second portion of the sub-collector and adjacent the first collector region, and a second collector region on a third portion of the sub-collector and adjacent the TI. A base on first collector region and a portion of the TI. An emitter is on a first portion of the base above the first collector region. The base includes a second portion horizontally displaced from the emitter in a first horizontal direction, and horizontally displaced from the second collector region in a second horizontal direction orthogonal to the first horizontal direction.


