Black Matrix Layer Positioning in Display Pixel Structure
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Solution Overview
Problem
The manufacturing process of Thin Film Transistor-Liquid Crystal Displays (TFT-LCDs) is complex, and the wide black matrix layer affects the aperture ratio of pixels due to errors in cell-assembly of color filter and array substrates, leading to increased power consumption.
Innovation Solution
A pixel structure with a black matrix layer positioned between the thin film transistor and the first electrode, simplifying the manufacturing process, improving aperture ratio, and reducing power consumption by forming the black matrix layer on the array substrate, which reduces parasitic capacitance and eliminates assembly errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the black matrix layer is formed wide to cover assembly errors between color filter and array substrates, then the reliability of display quality is improved, but the aperture ratio of pixels deteriorates
Solution Approach 1:
The black matrix layer is repositioned from the color filter substrate to the array substrate, changing its spatial dimension and reference frame. This dimensional shift allows the black matrix to cover TFT structures without needing to compensate for color filter-array alignment errors, thus maintaining narrow width while ensuring display quality.
2Reliability
If the black matrix layer is formed wide to ensure coverage, then the reliability of display quality is improved, but the manufacturing complexity increases
Solution Approach 1:
Instead of forming the black matrix layer on the color filter substrate as in conventional methods, the patent inverts the sequence by forming it on the array substrate first, before assembling with the color filter substrate. This inversion simplifies the manufacturing process by eliminating the need for wide black matrix design to compensate for assembly errors.
3Reliability
If the black matrix layer is formed wide to cover assembly errors, then the reliability is improved, but the power consumption increases
Solution Approach 1:
By repositioning the black matrix layer to the array substrate, the patent reduces the required width of the black matrix while maintaining display quality. This reduction in black matrix area decreases parasitic capacitance, thereby reducing power consumption without compromising reliability.
4Ease of manufacture
If the black matrix layer is formed on the color filter substrate, then the manufacturing process follows conventional methods, but the aperture ratio deteriorates due to assembly errors
Solution Approach 1:
The patent inverts the conventional manufacturing sequence by forming the black matrix layer on the array substrate before assembling with the color filter substrate. This inversion allows the black matrix to precisely cover TFT structures without being affected by color filter-array alignment errors, thus improving aperture ratio while maintaining ease of manufacture.
Data Source
AI summary
A display device, an array substrate, a pixel structure and a manufacturing method thereof are disclosed, and the pixel structure comprises a thin film transistor (101) and a first electrode (102) configured to form an electric field, the pixel structure further comprises a black matrix layer (103), and the black matrix layer (103) is located between the thin film transistor (101) and the first electrode (102). In the display device, the array substrate, the pixel structure and the manufacturing method, the black matrix layer is formed on the surface of the thin film transistor of the pixel structure, which simplifies the processes, saves materials, improves aperture ratio, and reduces parasitic capacitance between the common electrode and the data line to decrease the power consumption of the device.