Black Matrix Substrate Assembly for High-Resolution Reflective Walls
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing technologies lack clear methods for forming high-resolution black matrix patterns and light reflective dividing walls in display units, particularly due to issues with photolithography techniques and unclear materials and structures, leading to difficulties in forming thick patterns and reflective films.
Innovation Solution
A black matrix substrate assembly is designed with a transparent substrate, a black matrix pattern, a transparent resin layer, a resin wall pattern, a light reflective layer, and a transparent protective layer, where the layers have specific width relationships and alignment, allowing for the use of lower optical density black matrix patterns and reflective layers to achieve high resolution and effective light shielding.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If photolithography technique is used to form thick black matrix pattern with high optical density, then light shielding performance is improved, but exposure light cannot be transmitted through the film and pattern formation becomes difficult
Solution Approach 1:
The patent divides the black matrix formation process into multiple layers: a first black matrix layer with lower optical density that can be formed by photolithography, and a second black matrix layer with higher optical density that provides the required light shielding. This segmentation allows each layer to serve its specific function while being manufacturable with existing techniques.
Solution Approach 2:
The patent changes the optical density parameter across different layers of the black matrix structure. The first black matrix layer has a lower optical density (easier to form by photolithography) while the second layer has a higher optical density (better light shielding). This parameter variation resolves the contradiction between manufacturability and light shielding performance.
2Object-affected harmful factors
If photolithography technique is used to form light-scattering layer with thickness of 10 μm or more, then light scattering function is improved, but exposure light is scattered and resulting pattern has openings larger than photomask
Solution Approach 1:
The patent segments the light scattering function across multiple layers: a light-scattering layer with specific thickness and composition, and a black matrix structure with reflective layers. This segmentation allows the light-scattering layer to provide scattering function without requiring excessive thickness that would compromise pattern resolution.
Solution Approach 2:
The patent uses composite materials combining light-scattering particles with resin matrix in the light-scattering layer. This composite structure provides effective light scattering while maintaining manufacturability and pattern precision through controlled particle distribution and resin selection.
3Object-affected harmful factors
If thick light-shielding portion containing black colorant is formed, then light shielding performance is improved, but formation method is unclear and manufacturing becomes difficult
Solution Approach 1:
The patent segments the light-shielding function into multiple layers with different optical densities and materials. The first black matrix layer uses standard photolithography-formable materials with lower optical density, while the second black matrix layer provides additional shielding. This segmentation makes the formation method clear and manufacturable.
Solution Approach 2:
The patent introduces a light-scattering layer as an intermediary between the light source and the black matrix layers. This intermediary layer modifies the light path and reduces the required thickness of black matrix layers, making them easier to form with standard photolithography techniques while maintaining light shielding performance.
4Object-affected harmful factors
If high optical density black matrix pattern is formed to prevent light entry, then light shielding performance is improved, but exposure light is not transmitted and pattern formation becomes difficult
Solution Approach 1:
The patent segments the light shielding function across multiple layers with different optical densities. The first black matrix layer has lower optical density that allows exposure light transmission for precise photolithography patterning, while the second black matrix layer provides the required light shielding. This segmentation maintains both pattern formation precision and light shielding performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the formation of high-resolution black matrix patterns and light reflective dividing walls without thermal damage, ensuring efficient light shielding and reflection, while allowing for the use of thinner films that maintain display quality.
Implementation Method 1
a light reflective layer formed on the resin wall pattern
Data Source
AI summary
A black matrix substrate assembly including a transparent substrate, a black matrix pattern, a transparent resin layer, a resin wall pattern, a light reflective layer, and a transparent protective layer. The black matrix pattern includes first and second black linear segments with a width Ax of each first segment in a first direction. The resin wall pattern includes first and second wall linear segments with a width Dx of each first segment smaller than the width Ax in the first direction and the center line of each first segment aligned with that of the corresponding first black linear segment. The light reflective layer includes first and second reflective linear segments with a width Cx of each first segment larger than the width Dx in the first direction and the center line of each first segment aligned with that of the corresponding first black linear segment.