Black Partition Wall Pattern Film for Electrophoretic Smart Windows

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Solution Overview

Problem

Existing electrophoretic variable transmittance films face issues with increased visibility due to ball spacers, which affect the light blocking mode, and the photolithography process limits the uniformity and line width of partition wall patterns, leading to increased transmittance and operational inefficiencies.

Innovation Solution

A black partition wall pattern film is developed, comprising a transparent substrate with an electrode layer, a black partition wall pattern, and a black UV-curable resin layer, manufactured using an imprinting process to ensure desired line width and reduced transmittance, preventing light leakage in the light blocking mode.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If ball spacers are used to maintain distance between metal electrode pattern and transparent substrate, then the structure is simple and manufacturing is easy, but visibility increases and light blocking performance deteriorates

Engineering Contradiction:
Improveease of manufactureVSAvoidvisibility
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The invention extracts the spacer function from transparent ball spacers and relocates it to black partition wall patterns. The black patterns serve dual purposes: maintaining cell gap distance and blocking light, thereby eliminating the visibility problem caused by transparent spacers while preserving the structural simplicity

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention applies local quality by making the partition wall patterns black specifically in regions where light blocking is needed, while maintaining transparency in other areas. This localized coloration allows the partition walls to block light effectively without compromising the overall transparency of the electrophoretic display

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If photolithography process is used to form partition wall patterns, then the manufacturing process is established, but line width uniformity and pattern precision are limited

Engineering Contradiction:
Improveease of manufactureVSAvoidline width uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The invention replaces the photolithography process with an imprinting process. The imprinting mold directly transfers the desired pattern geometry to the resin layer, enabling precise control of line width and uniformity without relying on photomask alignment and exposure parameters that limit photolithography precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Illumination intensity

If partition wall patterns are made transparent to maintain overall transparency, then the display remains visible, but transmittance increases in light blocking mode

Engineering Contradiction:
ImprovetransparencyVSAvoidtransmittance increase
Core Design Contradiction:
Illumination intensityVSObject-affected harmful factors

Solution Approach 1:

The invention applies local quality by making the partition wall patterns black specifically in regions where light blocking is needed, while maintaining transparency in other areas. This localized coloration allows the partition walls to block light effectively without compromising the overall transparency of the electrophoretic display

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The black partition wall pattern film effectively prevents transmittance increase in the light blocking mode, simplifies the manufacturing process, and maintains optimal line width, enhancing the operational efficiency of electrophoretic smart windows.

Implementation Method 1

a black UV-curable resin layer provided in a region on the electrode layer where no black partition wall pattern is provided

Methodology Applied
Scientific EffectUV-curing: Photopolymerisation

Data Source

PatentEP3779597B1Black barrier wall pattern film and method for manufacturing same
Publication Date: 2024.10.16 LG CHEM LTD
  • EP3779597B1 patent drawingFigure 1~2
  • EP3779597B1 patent drawingFigure 3
  • EP3779597B1 patent drawingFigure 4

AI summary

A black partition wall pattern film according to an exemplary embodiment of the present application comprises: a transparent substrate; an electrode layer provided on the transparent substrate; a black partition wall pattern provided on the electrode layer; and a black UV-curable resin layer provided in a region on the electrode layer where no black partition wall pattern is provided.