Black Partition Wall Pattern Film for Electrophoretic Smart Windows
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Solution Overview
Problem
Existing electrophoretic variable transmittance films face issues with increased visibility due to ball spacers, which affect the light blocking mode, and the photolithography process limits the uniformity and line width of partition wall patterns, leading to increased transmittance and operational inefficiencies.
Innovation Solution
A black partition wall pattern film is developed, comprising a transparent substrate with an electrode layer, a black partition wall pattern, and a black UV-curable resin layer, manufactured using an imprinting process to ensure desired line width and reduced transmittance, preventing light leakage in the light blocking mode.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If ball spacers are used to maintain distance between metal electrode pattern and transparent substrate, then the structure is simple and manufacturing is easy, but visibility increases and light blocking performance deteriorates
Solution Approach 1:
The invention extracts the spacer function from transparent ball spacers and relocates it to black partition wall patterns. The black patterns serve dual purposes: maintaining cell gap distance and blocking light, thereby eliminating the visibility problem caused by transparent spacers while preserving the structural simplicity
Solution Approach 2:
The invention applies local quality by making the partition wall patterns black specifically in regions where light blocking is needed, while maintaining transparency in other areas. This localized coloration allows the partition walls to block light effectively without compromising the overall transparency of the electrophoretic display
2Ease of manufacture
If photolithography process is used to form partition wall patterns, then the manufacturing process is established, but line width uniformity and pattern precision are limited
Solution Approach 1:
The invention replaces the photolithography process with an imprinting process. The imprinting mold directly transfers the desired pattern geometry to the resin layer, enabling precise control of line width and uniformity without relying on photomask alignment and exposure parameters that limit photolithography precision
3Illumination intensity
If partition wall patterns are made transparent to maintain overall transparency, then the display remains visible, but transmittance increases in light blocking mode
Solution Approach 1:
The invention applies local quality by making the partition wall patterns black specifically in regions where light blocking is needed, while maintaining transparency in other areas. This localized coloration allows the partition walls to block light effectively without compromising the overall transparency of the electrophoretic display
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The black partition wall pattern film effectively prevents transmittance increase in the light blocking mode, simplifies the manufacturing process, and maintains optimal line width, enhancing the operational efficiency of electrophoretic smart windows.
Implementation Method 1
a black UV-curable resin layer provided in a region on the electrode layer where no black partition wall pattern is provided
Data Source
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AI summary
A black partition wall pattern film according to an exemplary embodiment of the present application comprises: a transparent substrate; an electrode layer provided on the transparent substrate; a black partition wall pattern provided on the electrode layer; and a black UV-curable resin layer provided in a region on the electrode layer where no black partition wall pattern is provided.