Black Paste Composition for Laser Direct Imaging
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Solution Overview
Problem
Conventional methods for forming black matrix patterns in flat display devices face challenges such as defects and positional fluctuations due to photomask expansion and shrinkage, high production costs, and insufficient throughput in laser direct imaging, primarily due to low sensitivity of conventional photosensitive black paste compositions.
Innovation Solution
A black paste composition containing a carboxyl group-containing resin, glass frit, black pigment, a compound with radically polymerizable unsaturated groups, and an oxime-based photopolymerization initiator, which is highly photohardenable to light sources emitting a laser with a maximum wavelength of 350 to 420 nm, allowing for efficient formation of high-definition black matrix patterns using a laser direct imaging device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If laser direct imaging is used to improve throughput, then production efficiency increases, but photohardening efficiency is insufficient due to low sensitivity of conventional compositions
Solution Approach 1:
The patent changes the chemical parameters of the photosensitive composition by introducing a specific oxime-based photopolymerization initiator (formula I) with defined molecular structure parameters (R1, R2, R3 groups). This parameter change enables the composition to achieve high photohardening efficiency at laser wavelengths of 350-420 nm, resolving the sensitivity issue while maintaining throughput
Solution Approach 2:
The patent creates a composite photosensitive composition combining carboxyl group-containing resin (A), glass frit (B), black pigment (C), polymerizable unsaturated compound (D), and oxime-based photopolymerization initiator (E-1). This composite material achieves both high laser sensitivity and efficient photohardening, simultaneously improving productivity and reliability
2Manufacturing precision
If photomask exposure method is used to achieve high sensitivity, then pattern formation quality improves, but positional fluctuations occur due to photomask expansion and shrinkage
Solution Approach 1:
The patent extracts and eliminates the photomask component from the exposure system by using laser direct imaging. The photosensitive composition is designed to be directly exposed by laser scanning without requiring a physical photomask, thereby removing the source of positional fluctuations caused by thermal expansion and shrinkage
Solution Approach 2:
The patent replaces the mechanical photomask exposure system with an optical laser direct imaging system. The pattern is formed by direct laser scanning of the photosensitive composition, substituting the mechanical photomask positioning system with an optical field-based exposure method that eliminates mechanical expansion and shrinkage issues
3Manufacturing precision
If photomask exposure method is used to achieve high definition patterns, then pattern quality improves, but production costs increase due to photomask preparation
Solution Approach 1:
The patent adopts a disposable-free approach by eliminating photomasks entirely. The laser direct imaging method uses digital pattern data that can be directly scanned and exposed without requiring physical photomask fabrication, reducing production costs while maintaining high definition pattern quality
Solution Approach 2:
The patent uses digital pattern copying from CAD data directly to the photosensitive composition via laser scanning. Instead of creating physical photomask copies, the pattern information is copied optically through laser exposure, eliminating photomask preparation costs while preserving pattern definition quality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enhances photohardening efficiency, reduces positional fluctuations and pattern defects, and lowers production costs by eliminating the need for photomasks, resulting in a highly reliable and cost-effective method for forming high-definition black matrix patterns.
Implementation Method 1
an oxime-based photopolymerization initiator (E-1) which has a structure represented by general formula (I)... The composition enhances photohardening efficiency
Data Source
AI summary
An object of the present invention is to provide a black paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition black matrix pattern efficiently, and superior in storage stability, a black matrix pattern formed by using the composition, a plasma display having the pattern, and a method of forming the black matrix pattern by using the composition. An alkali development-type black paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a black pigment, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).