Black Quartz Glass Composition for Uniform Light Shielding at Scale
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Solution Overview
Problem
Existing black quartz glass technologies face issues with color uniformity, contamination risk, and low productivity, particularly when scaled up for semiconductor manufacturing applications, due to high production temperatures and the presence of metallic impurities.
Innovation Solution
A black quartz glass composition comprising Si, SiO, and SiO2 with specific concentrations, produced through pressure-molding and sintering at lower temperatures, ensuring homogeneous dispersion of Si and SiO particulates, and avoiding metallic impurities.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If conventional black glass is used for light-shielding, then light-shielding property is provided, but color uniformity deteriorates when size is enlarged
Solution Approach 1:
The invention changes the chemical composition parameters by specifying precise ranges for SiO2 (92-99.5 wt%), SiO (0.1-5 wt%), and Si (0.5-10 wt%), while eliminating metallic impurities. This parameter optimization ensures uniform color distribution even in large-sized products, resolving the contradiction between light-shielding property and color uniformity at scale.
2Temperature
If production temperature is increased to 1800°C or more, then black quartz glass is obtained, but energy consumption increases and productivity deteriorates
Solution Approach 1:
The invention optimizes the chemical composition parameters (SiO2: 92-99.5 wt%, SiO: 0.1-5 wt%, Si: 0.5-10 wt%) to enable sintering at lower temperatures (1200-1435°C). This parameter optimization reduces energy consumption and allows the use of conventional furnace materials, thereby improving productivity while maintaining product quality.
3Ease of manufacture
If niobium pentachloride is used as additive, then black quartz glass is produced, but contamination risk increases for semiconductor manufacturing
Solution Approach 1:
The invention extracts and eliminates harmful metallic impurities (Ni, Cr, Mn, Fe, Co, Cu, Zn, Mo, Nb, Ta, W) from the composition. By replacing niobium pentachloride with silicon-containing compounds (SiO, Si), the invention removes contamination risks while maintaining ease of manufacture through simplified material selection and processing.
4Illumination intensity
If conventional black glass is used, then local light-shielding is provided, but infrared heat absorption/storage property is insufficient
Solution Approach 1:
The invention optimizes the composition parameters by controlling SiO (0.1-5 wt%) and Si (0.5-10 wt%) content within the silica matrix. This parameter optimization enhances infrared heat absorption and storage capabilities while maintaining light-shielding properties, enabling the material to function as an effective heat management solution in semiconductor manufacturing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides black quartz glass with excellent light-shielding properties, uniform color, high productivity, and no contamination risk, suitable for optical components and infrared heat management in semiconductor manufacturing.
Implementation Method 1
a black quartz glass which contains Si of 0.5 to 10 mass%, SiO of 0.1 to 5 mass% and SiO2 of a remainder, wherein each content of metallic impurities other than Si element is 1 ppm or less
Implementation Method 2
the SCE reflectance at a wavelength of 350 nm to 750 nm is 10% or less
Implementation Method 3
there is a need for the shielding member against infrared irradiation to parts other than the target object to be heated and for the infrared heat absorption/storage member
Implementation Method 4
a method for producing the black quartz glass by mixing a quartz glass powder and niobium pentachloride, converting the niobium pentachloride to niobium pentoxide, and then heating to 1800°C or more to reduce and melt
Data Source
AI summary
The present invention relates to a black quartz glass comprising Si of 0.5 to 10 mass%, SiO of 0.1 to 5 mass% and SiO2 of the residue, wherein the SCE reflectance at a wavelength of 350 nm to 750 nm is 10% or less; a method for producing the black quartz glass, comprising: pressure-molding a powder obtained by mixing and consolidating (1) fumed silica, or (2) a mixture powder of fumed silica and a synthetic silica powder, or (3) a mixture powder of fumed silica, spherical silica and a synthetic silica powder, with a Si powder of 0.5 to 10 mass% and a SiO powder of 0.1 to 5 mass%, and heating and sintering the pressure-molded product in the atmosphere; and a product comprising a black quartz glass member made of the black quartz glass. The present invention allows to provide a black quartz glass which has an excellent light-shielding property, has no risk of causing contamination in a step of using it, has sufficient color uniformity when the size is enlarged, and is capable of producing a large ingot, and to provide a method for producing the black quartz glass with excellent productivity even in the large ingot, and to provide a black quartz glass product made of the black quartz glass.