Blanking Aperture Array Beam Shield Defective Blankers

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Solution Overview

Problem

In multi-charged particle beam writing apparatuses, defective blankers on the blanking aperture array fail to apply the required voltage, resulting in beams that remain in the ON state, which deteriorates writing accuracy due to uncontrolled beam deflection.

Innovation Solution

The blanking aperture array includes both normal and defective blankers, where normal blankers have through holes for voltage application and beam control, while defective blankers have recesses filled with a beam shield to prevent beam passage, ensuring all beams can be properly deflected and improving writing accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If multiple blankers are provided on the blanking aperture array, then beam control capability is improved, but defective blankers may occur that cannot apply the required voltage

Engineering Contradiction:

Improvebeam control capabilityVSAvoidblanker functionality

Core Design Contradiction:

Adaptability or versatilityVSReliability

Solution Approach 1:

The patent applies preliminary action by pre-identifying defective blankers through testing before final assembly, and pre-filling their through-holes with beam shields to prevent harmful beam passage. This proactive approach eliminates defective beams before they can affect writing accuracy.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent converts the harmful effect of defective blankers (inability to deflect beams) into a beneficial configuration by filling their through-holes with beam shields. This transforms defective blankers into functional beam-blocking elements, ensuring all beams can be properly controlled.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

2Device complexity

If defective blankers are not addressed, then device complexity is reduced, but writing accuracy deteriorates due to uncontrolled beam deflection

Engineering Contradiction:

Improveblanking aperture array structureVSAvoidwriting accuracy

Core Design Contradiction:

Device complexityVSManufacturing precision

Solution Approach 1:

The patent applies the extraction principle by removing the through-hole structure from defective blankers and replacing it with beam shields. This extracts the problematic beam passage path while maintaining the blanker's positional structure, preventing defective beams from being produced.

Inventive Principle:

Principle #2Taking out (Extraction)

3Ease of manufacture

If through holes are provided in all blankers, then ease of manufacture is improved, but defective beams are produced when voltage application fails

Engineering Contradiction:

Improveblanking aperture array fabricationVSAvoidbeam control reliability

Core Design Contradiction:

Ease of manufactureVSReliability

Solution Approach 1:

The patent applies local quality by differentiating the internal structure of blankers based on their functional status. Normal blankers have through-holes for beam passage, while defective blankers have beam shields filling their through-holes. This localized structural differentiation ensures each blanker's structure matches its functional capability.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively prevents defective beams from being produced, enhancing the writing accuracy by ensuring all beams can be controlled to enter the OFF state, thereby improving the precision of pattern formation on semiconductor devices.

Implementation Method 1

Each of the plurality of blankers includes a blanking electrode and a ground electrode that are formed on a first surface of the substrate. The plurality of blankers includes at least a normal blanker which is capable of applying a predetermined voltage between the blanking electrode and the ground electrode

Methodology Applied

Scientific EffectElectric field: Electric Field

Implementation Method 2

a through hole bored through the substrate is filled with a beam shield

Methodology Applied

Scientific EffectBeam blocking: Absorption (EM radiation)

Data Source

PatentUS10340120B2Blanking aperture array, method for manufacturing blanking aperture array, and multi-charged particle beam writing apparatus

Publication Date: 2019.07.02 NUFLARE TECH INC

AI summary

In one embodiment, a blanking aperture array is for a multi-charged particle beam writing apparatus. The blanking aperture array includes a substrate and a plurality of blankers. Each of the plurality of blankers includes a blanking electrode and a ground electrode that are formed on a first surface of the substrate. The plurality of blankers includes at least a normal blanker which is capable of applying a predetermined voltage between the blanking electrode and the ground electrode and for which a through hole bored through the substrate is formed, and a defective blanker which is not capable of applying the predetermined voltage between the blanking electrode and the ground electrode and for which the through hole bored through the substrate is filled with a beam shield.