Blazed Grating Fabrication via Nanoimprinted Mask

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Solution Overview

Problem

The existing methods for fabricating blazed gratings are costly, lack precision, and are complex, making it difficult to achieve high-quality subwavelength blazed gratings.

Innovation Solution

A method involving the use of a multi-layered mask layer with a first mask layer of ZEP520A and a second mask layer of HSQ, patterned using nanoimprinting and etching techniques to create bar-shaped protruding structures that slant face-to-face, resulting in high-resolution three-dimensional nano-structures on a substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography is used to etch the mask layer, then the blazed grating can be fabricated, but the cost is expensive and the precision is not high

Engineering Contradiction:

Improvemask layer precisionVSAvoidfabrication cost

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent changes the key parameter from conventional photolithography to nanoimprinting technology. This parameter change enables simultaneous achievement of high precision (resolution below 100nm) and low cost, as nanoimprinting uses a direct physical stamping method rather than complex optical systems, eliminating expensive photolithography equipment while achieving superior resolution

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent replaces the optical-based photolithography system with a mechanical nanoimprinting system. The nanoimprinting process uses a physical stamp or mold to directly pattern the mask layer, substituting complex optical alignment and exposure systems with a simpler mechanical pressing operation, thereby reducing cost while improving precision

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If conventional etching methods are used, then the grating can be fabricated, but the process is complicated

Engineering Contradiction:

Improveblazed grating precisionVSAvoidfabrication process complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent merges multiple separate fabrication steps into a more integrated process. The nanoimprinting step simultaneously creates the mask pattern and defines the grating geometry, combining mask formation and pattern transfer into a more unified process flow, thereby reducing overall process complexity while maintaining high precision

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The patent performs preliminary patterning action through nanoimprinting before the actual etching step. The mask layer is pre-patterned with high precision using nanoimprinting, so that subsequent etching follows a well-defined template, simplifying the etching process itself and reducing the need for complex process controls

Inventive Principle:

Principle #10Preliminary action

Data Source

PatentUS8801946B2Method for making grating

Publication Date: 2014.08.12 HON HAI PRECISION INDUSTRY CO LTD

AI summary

A method for making grating is provided. The method includes following steps. A substrate is provided. A mask layer is located on the substrate. The mask layer is patterned, and a number of bar-shaped protruding structures are formed on a surface of the mask layer, a slot is defined between each of two adjacent protruding structures of the number of protruding structures to expose a portion of the substrate. The protruding structures are etched so that each of two adjacent protruding structures begin to slant face to face until they are contacting each other. The exposed portion of the substrate is etched through the slot. The mask layer is removed.