Block Copolymer Alignment via Neutral Layer and Hydrophobic Guides
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Solution Overview
Problem
Existing methods for forming fine resist patterns using block copolymers face challenges in achieving precise alignment due to small process margins, particularly when the diameter of guide patterns deviates by several nanometers, limiting the ability to form predetermined patterns on substrates with high accuracy.
Innovation Solution
A substrate treatment method involving the formation of a neutral layer, followed by circular patterns of hydrophobic coating films, application of a block copolymer, phase-separation into hydrophilic and hydrophobic polymers, and selective removal of hydrophilic polymers, with adjustments in molecular weight ratios and pattern diameters to ensure alignment at hexagonal close-packed structures, utilizing hydrophobic films as guides to enhance alignment precision and process margins.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If hydrophilic films are used as guides for block copolymer alignment, then alignment can be achieved, but the process margin becomes extremely small requiring diameter control accuracy of several nanometers
Solution Approach 1:
The patent introduces a neutral layer as an intermediary between the substrate and the block copolymer. This neutral layer has intermediate affinity to both hydrophilic and hydrophobic polymers, preventing unwanted interactions and enabling the block copolymer to self-organize into the desired hexagonal close-packed structure without requiring extremely precise control of guide pattern dimensions.
2Manufacturing precision
If the wavelength of light for exposure processing is increasingly shortened to form finer resist patterns, then pattern density increases, but technique and cost limits are reached
Solution Approach 1:
The patent employs self-organized block copolymers that spontaneously form hexagonal close-packed structures through phase separation. This self-assembly mechanism eliminates the need for complex short-wavelength exposure systems, achieving finer pattern density through the inherent self-organizing properties of the block copolymer material rather than through increasingly sophisticated lithography equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the appropriate formation of predetermined patterns on substrates with improved process margins and alignment precision, enabling the formation of fine patterns even when guide pattern diameters are slightly off, compared to traditional methods relying on hydrophilic films.
Implementation Method 1
when the block copolymer is phase-separated into the hydrophilic polymer and the hydrophobic polymer
Implementation Method 2
hydrophilic polymers autonomously and regularly align in sequence at positions corresponding to the hexagonal close-packed structure
Implementation Method 3
utilizing hydrophobic films as guides to enhance alignment precision
Data Source
AI summary
A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polymer separating step, and at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of circular patterns of hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern is set so that the first hydrophilic polymers and the second hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in a plan view.