Self-Assembling Block Copolymer Multilayer Antireflection Coatings

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Solution Overview

Problem

Conventional antireflective coatings in semiconductor processing, such as BARC and DARC, are ineffective at absorbing all reflected light and are costly and time-intensive to produce, limiting the precision and efficiency of photo imaging processes, especially when dealing with non-planar substrates.

Innovation Solution

The use of self-assembling block copolymers, which form multilayer antireflection layers through a single annealing step, effectively absorbing light from various angles by creating periodic structures at nanometer-scale dimensions, thereby improving the efficiency and reducing the cost and time required for coating deposition.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If conventional single-layer antireflective coatings (BARC or DARC) are used, then the process is simple and cost-effective, but the light absorption efficiency is insufficient (only 90% effective at absorbing reflected light from a single angle)

Engineering Contradiction:
Improvelight absorption efficiencyVSAvoidcoating structure complexity
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent divides the antireflective coating into multiple alternating layers of block copolymer and homopolymer, creating a segmented multilayer structure. This segmentation allows each layer to contribute to light absorption from different angles, achieving superior light absorption efficiency (exponentially increasing absorption) compared to single-layer coatings, while the self-assembling process keeps the manufacturing complexity manageable.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent employs composite materials by combining block copolymers with homopolymers to form a multilayer antireflective coating. The block copolymer provides the self-assembling capability to form periodic structures, while the homopolymer components contribute to the overall light absorption properties. This composite approach enables the coating to absorb light from multiple angles effectively.

Inventive Principle:
Principle #40Composite materials

2Loss of energy

If double-layer antireflective coatings are formed by vacuum evaporation to improve light absorption efficiency, then the light absorption effectiveness increases exponentially, but the manufacturing cost and time increase significantly

Engineering Contradiction:
Improvelight absorption efficiencyVSAvoidcoating deposition time
Core Design Contradiction:
Loss of energyVSLoss of time

Solution Approach 1:

The patent merges multiple coating deposition steps into a single spin-coating process. By combining the block copolymer and homopolymer into a single coating solution that is applied in one step, the process achieves multilayer light absorption efficiency without requiring multiple separate deposition operations. This eliminates the time-consuming sequential deposition process while maintaining the exponential light absorption improvement.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent utilizes self-service through self-assembly, where the block copolymer components automatically organize into periodic multilayer structures after a single annealing step. This self-organizing behavior eliminates the need for complex, time-intensive deposition processes, as the structure forms autonomously from the single applied coating layer.

Inventive Principle:
Principle #25Self-service

3Measurement precision

If conventional antireflective coatings are used on non-planar substrates, then the process is simple, but the reflected light scatters and inadvertently exposes surrounding photoresist regions, reducing imaging precision

Engineering Contradiction:
Improvephoto imaging precisionVSAvoidcoating process complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent applies local quality by creating a coating that adapts to local substrate variations. The self-assembling block copolymer structure forms periodic patterns that conform to the local substrate topology, providing consistent light absorption properties across non-planar surfaces. This local adaptation ensures that reflected light is absorbed regardless of substrate curvature or irregularities, preventing scattered light from exposing surrounding photoresist regions.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The self-assembling block copolymer antireflection layers significantly enhance the absorption of reflected light, improving the accuracy and precision of photo imaging processes while being more cost-effective and efficient than traditional multilayer coatings.

Implementation Method 1

The use of self-assembling block copolymers, which form multilayer antireflection layers through a single annealing step

Methodology Applied
Scientific EffectSelf-assembly: Self-Assembly

Implementation Method 2

which form multilayer antireflection layers through a single annealing step

Methodology Applied
Scientific EffectAnnealing: Annealing

Implementation Method 3

effectively absorbing light from various angles by creating periodic structures at nanometer-scale dimensions

Methodology Applied
Scientific EffectLight absorption: Absorption (EM radiation)

Data Source

PatentUS8551808B2Methods of patterning a substrate including multilayer antireflection coatings
Publication Date: 2013.10.08 MICRON TECHNOLOGY INC
  • US8551808B2 patent drawing
  • US8551808B2 patent drawing
  • US8551808B2 patent drawing

AI summary

Multi-layer antireflection coatings, devices including multi-layer antireflection coatings and methods of forming the same are disclosed. A block copolymer is applied to a substrate and self-assembled into parallel lamellae above a substrate. The block copolymer may optionally be allowed to self-assemble into a multitude of domains oriented either substantially parallel or substantially perpendicular to an underlying substrate.