Block Copolymer Self-Alignment for Contact Hole Diameter Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current methods for forming contact holes in semiconductor devices do not effectively accommodate line-and-space patterns with varying widths, particularly failing to create holes of different radii for diverse line-and-space patterns, which is essential for advanced semiconductor manufacturing.
Innovation Solution
A pattern forming method involving the use of hydrophilic and hydrophobic block copolymers, where a guide pattern with different hole diameters is created, and specific block copolymers are supplied to each region to self-align and reduce hole diameters through selective removal of hydrophilic polymer chains, allowing etching with hydrophobic chains as a mask to form holes of precise diameters in memory cell and peripheral circuit regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If block copolymers are supplied as a solution to recesses of different widths, then the solution diffuses uniformly into the entire recess, but this prevents formation of contact holes with different radii for different line-and-space patterns
Solution Approach 1:
The patent applies local quality by making different regions of the guide pattern have different hole diameters corresponding to different line-and-space pattern widths. The first hole pattern has a first diameter and the second hole pattern has a second diameter, allowing each region to be tailored to its specific patterning needs. This enables contact holes of different radii to be formed in different regions while maintaining manufacturing precision through the self-aligning block copolymer mechanism.
Solution Approach 2:
The patent changes the parameter of hole diameter in the guide pattern to match different line-and-space pattern widths. By varying the hole diameter parameter across different regions (first hole diameter for first region, second hole diameter for second region), the system adapts to form contact holes with appropriate radii for each type of line-and-space pattern, resolving the contradiction between versatility and precision.
2Adaptability or versatility
If multiple patterning processes are used to form contact holes for different line-and-space patterns, then contact holes of different radii can be formed, but manufacturing complexity and costs increase
Solution Approach 1:
The patent merges multiple patterning operations into a single unified process. By forming a guide pattern with multiple hole patterns of different diameters in one step, and then using block copolymer self-alignment to simultaneously create contact holes of different radii for different line-and-space patterns, the invention eliminates the need for separate patterning processes. This reduces device complexity while maintaining the ability to form contact holes of varying radii.
Solution Approach 2:
The guide pattern serves multiple functions: it defines the positions of contact holes, determines their radii through varying hole diameters, and guides block copolymer self-alignment. This multi-functional guide pattern enables a single process to achieve what previously required multiple specialized patterning steps, reducing overall process complexity while maintaining versatility.
3Manufacturing precision
If traditional photolithography methods are used, then the process is simple, but smaller hole diameters cannot be achieved
Solution Approach 1:
The patent employs self-service through block copolymer self-alignment. The block copolymers automatically organize themselves around the guide pattern holes without requiring additional complex patterning steps. This self-organizing mechanism enables the formation of smaller contact hole diameters than traditional photolithography while keeping the process relatively simple, as the block copolymers perform the fine-patterning function autonomously.
Solution Approach 2:
The invention uses composite block copolymer materials with specific hydrophilic and hydrophobic block compositions that enable self-alignment around the guide pattern. These composite polymer materials provide the dual functionality of forming stable micellar structures that define contact hole positions and sizes, achieving smaller hole diameters through material properties rather than complex process equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the simultaneous formation of contact holes with varying diameters, reducing manufacturing complexity and costs by eliminating the need for separate patterning processes for different regions, while achieving smaller hole diameters than traditional photolithography methods.
Implementation Method 1
the solution supplied in the first recess and the second recess directly diffuses into the entire first recess and second recess
Implementation Method 2
a hydrophobic polymer chain condenses so as to come into contact with the guide pattern
Implementation Method 3
a hydrophilic polymer chain condenses around a center of the first hole pattern
Data Source
AI summary
According to one embodiment, first, on a process object, a hydrophilic guide pattern including a first hole forming pattern having a first hole diameter and a second hole forming pattern having a second hole diameter is formed. Then, above the guide pattern, a frame pattern having a first opening region in a forming region of a plurality of the first hole forming patterns and a second opening region in a forming region of a plurality of the second hole forming patterns is formed. Then, a first solution including a first block copolymer having a hydrophilic polymer chain and a hydrophobic polymer chain is supplied to the first opening region to condense the first block copolymer. The hydrophilic polymer chain is then removed to reduce the diameter of the first hole forming pattern to a third hole diameter that is smaller than the first hole diameter.