Block Copolymer Labile Group Directed Self-Assembly
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Solution Overview
Problem
Current pattern formation methods for semiconductor devices and other microfabrication processes face challenges in achieving high regularity and miniaturization due to limitations in phase separation and rectangularity of patterns, particularly with the increasing demand for finer features.
Innovation Solution
A composition comprising a block copolymer with a labile group capable of dissociation by acid or heat is applied to a substrate, forming a directed self-assembling film with enhanced phase separation ability and rectangularity of patterns through controlled exposure and etching processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography methods are used for pattern formation, then existing manufacturing capabilities are maintained, but further miniaturization and high regularity are not achieved
Solution Approach 1:
The block copolymer performs directed self-assembly spontaneously without requiring external guidance structures. The polymer blocks automatically organize into phase-separated patterns through their inherent incompatibility, eliminating the need for guide layers and reducing process complexity while achieving high regularity patterns
Solution Approach 2:
The invention changes the chemical parameters of the polymer by incorporating labile groups that can be dissociated by acid or heat. This parameter change enables the block copolymer to undergo controlled phase separation and morphological changes during processing, improving pattern formation capability and regularity
2Manufacturing precision
If block copolymer directed self-assembly is used, then phase separation is achieved, but rectangularity of patterns is insufficient
Solution Approach 1:
The block copolymer incorporates labile groups (such as protecting groups or end groups) that can be selectively dissociated by acid or heat treatment. This parameter change enables controlled modification of block properties during processing, allowing the formation of patterns with improved rectangularity while maintaining phase separation ability
Solution Approach 2:
The labile groups are pre-installed on the block copolymer chains before self-assembly occurs. These groups undergo dissociation at specific stages of the process to pre-condition the polymer morphology, enabling subsequent formation of patterns with better rectangularity without requiring additional guide structures
3Manufacturing precision
If guide layers are overlaid on substrates to improve pattern regularity, then directed self-assembly is enhanced, but device complexity increases
Solution Approach 1:
The block copolymer performs directed self-assembly spontaneously without requiring external guidance structures. The polymer blocks automatically organize into phase-separated patterns through their inherent incompatibility, eliminating the need for guide layers and reducing process complexity while achieving high regularity patterns
Solution Approach 2:
The invention extracts and removes the guide layer component from the pattern formation process. By using block copolymers with labile groups that enable self-directed assembly, the unnecessary guide layer is eliminated, simplifying the overall device structure and reducing manufacturing complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method results in superior phase separation and rectangularity of patterns, enabling more precise and miniaturized feature formation suitable for advanced semiconductor devices and future technological advancements.
Implementation Method 1
The first acid liable group is capable of being dissociated by an acid or heat
Implementation Method 2
The first acid liable group is capable of being dissociated by an acid or heat
Implementation Method 3
subsequent annealing results in clustering of blocks having the same property, whereby phase separation is caused
Implementation Method 4
a composition that contains a block copolymer constituted with a plurality of blocks each having distinct properties is applied on a substrate, and subsequent annealing results in clustering of blocks having the same property, whereby phase separation is caused
Data Source
AI summary
A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R′ represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.