Block Copolymer Self-Assembly Pattern Prediction
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Solution Overview
Problem
Current methods for determining self-assembly patterns of block copolymers confined within closed contours are too slow and not precise enough for use in production, particularly for large-scale integrated circuits, as they rely on iterative algorithms and do not efficiently account for deviations in guiding contours created by lithography.
Innovation Solution
A computer-implemented method that uses a geometric transformation of a reference contour from a database to predict the self-assembly pattern within a guide contour, involving sampling and triangulation of contours, and applying a physical modeling algorithm for refinement, allowing for faster and more precise pattern determination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If iterative physical modeling algorithms are used to determine self-assembly patterns, then measurement precision is improved, but productivity deteriorates due to computational slowness
Solution Approach 1:
The patent pre-computes and stores reference self-assembly patterns for standard guide contour shapes in a database before actual production use. During production, instead of running slow iterative physical modeling algorithms, the system performs rapid pattern retrieval and geometric transformation based on the pre-stored reference patterns, thus achieving both high speed and acceptable accuracy for manufacturing applications
Solution Approach 2:
The patent creates simplified geometric representations (copies) of the complex physical self-assembly process by storing reference patterns that capture the essential features without the full physical complexity. These copied patterns are then transformed geometrically to match actual guide contours, providing a fast approximation that avoids the computational burden of full physical modeling while maintaining sufficient accuracy for production
2Productivity
If geometric transformation of reference patterns is used, then productivity is improved through faster computation, but measurement precision may deteriorate compared to full physical modeling
Solution Approach 1:
The system pre-computes reference patterns using accurate physical modeling and stores them in a database. These pre-computed patterns serve as accurate baseline references that capture the essential physics of self-assembly. During production, geometric transformations of these pre-computed patterns provide fast results that maintain sufficient accuracy for manufacturing decision-making
Solution Approach 2:
The patent transforms reference patterns using geometric parameter changes (scaling, rotation, distortion) that match the actual guide contour dimensions and shape. This allows the system to adapt accurate reference patterns to specific production cases through simple geometric parameter adjustments rather than full re-computation, maintaining both speed and accuracy
3Adaptability or versatility
If a database of reference contours is maintained, then adaptability is improved for handling lithography deviations, but device complexity increases
Solution Approach 1:
The patent creates a universal database of reference patterns that can serve multiple guide contour shapes and sizes. A single reference pattern can be geometrically transformed to match various actual guide contours, making the system adaptable to different lithography deviations without requiring separate models for each case. This multi-functional approach handles diversity through transformation rather than through multiple specialized components
Solution Approach 2:
The system uses simplified geometric copies of reference patterns stored in the database. These copied patterns are lightweight representations that can be rapidly retrieved and transformed. The copying approach reduces the complexity of storing and processing full physical models while maintaining the essential features needed for pattern prediction across different guide contour variations
Data Source
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AI summary
A method for defining a self-assembling unit (MAA) of a block copolymer confined within a closed contour, referred to as the guide contour (CG), comprising the following steps, implemented by computer: a) choosing, from a database, a closed contour referred to as the reference contour (CR) close to said guide contour, a self-assembling unit of said block copolymer, referred to as the reference unit (MR), being associated with said reference contour; b) applying a geometric transformation to a plurality of points (P) of said reference unit in order to convert them into respective points, referred to as image points (PIM), of the self-assembling unit that is to be defined. A computer program product for implementing such a method.