Block Copolymer Phase Separation for Dimension Uniformity
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Solution Overview
Problem
The existing methods for forming phase-separated structures using block copolymers face challenges in achieving uniformity in hole dimensions, as evidenced by the difficulty in improving in-plane dimension uniformity (CDU) in fine patterns.
Innovation Solution
A method involving the application of a block copolymer solution with a poor solvent, where the solvent exhibits poor solubility for one of the blocks, to form a layer with a film thickness less than 100 nm, and subsequent phase-separation, with the solvent composition comprising 50% or less poor solvent by weight, and structural unit constituting 50 mol% or more of the homopolymer A, to enhance uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional block copolymer phase separation methods are used, then fine patterns can be formed, but in-plane dimension uniformity (CDU) deteriorates
Solution Approach 1:
The invention changes the solvent composition parameter by introducing a poor solvent component (5-50 wt%) that selectively interacts with one block of the block copolymer. This parameter change modifies the phase separation behavior to improve CDU, transforming the correlation from positive to negative and achieving excellent in-plane dimension uniformity
Solution Approach 2:
The invention uses a composite solvent system combining a good solvent and a poor solvent. This composite solvent composition (5-50 wt% poor solvent) creates controlled phase separation that improves both CDU and pattern uniformity, resolving the technical contradiction between manufacturing precision and reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively improves the uniformity of phase-separated structures by canceling the CDU-CD correlation, resulting in excellent in-plane dimension uniformity of the formed patterns.
Implementation Method 1
it is necessary to form a self-organized nano structure by a microphase separation only in specific regions
Implementation Method 2
a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer
Data Source
AI summary
A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.


