Block Copolymer Phase-Separated Structure Pitch Control
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Solution Overview
Problem
Current methods for forming phase-separated structures using block copolymers are limited by the need for multiple block copolymers to achieve different pitches, which restricts the applicability and process margin in pattern formation for advanced integrated circuits.
Innovation Solution
A resin composition comprising a block copolymer with a first block, a second block, and a third block, where the structure and number-average molecular weight of the third block are smaller than those of the first block, allowing for a broader range of pitch formation and improved process margin.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple block copolymers with different molecular weights are used to achieve different pitches, then the pitch design range is improved, but the device complexity and process complexity increase
Solution Approach 1:
The patent applies universality by designing a single block copolymer with a specific molecular weight distribution that can produce multiple pitch values. The block copolymer comprises a first block and a second block with a number-average molecular weight ratio within a specific range, enabling one material to serve multiple pitch formation functions rather than requiring separate block copolymers for each pitch.
Solution Approach 2:
The patent utilizes parameter changes by controlling the number-average molecular weight ratio between the first block and second block within a specific range (0.3 to 2.0). By adjusting this molecular weight parameter, the same block copolymer structure can generate different pitch values, allowing pitch variation through material parameter optimization rather than structural redesign.
2Adaptability or versatility
If a single block copolymer is used for multiple pitches, then the process margin is improved, but the manufacturing precision may be compromised
Solution Approach 1:
The patent achieves both process margin improvement and manufacturing precision by precisely controlling the number-average molecular weight ratio parameter within the range of 0.3 to 2.0. This parameter optimization allows the block copolymer to maintain sharp phase separation and well-defined domain spacing while being adaptable to multiple pitch requirements, thus preserving manufacturing precision across different pitch applications.
Solution Approach 2:
The patent employs composite material design by creating a block copolymer with specifically engineered composition - a first block and a second block with controlled molecular weight ratio. This composite structure enables the material to exhibit both versatility for multiple pitches and precision for manufacturing, as the contrasting blocks provide sharp interfaces and well-defined self-assembly behavior.
3Reliability
If the molecular weight ratio between first block and third block is optimized, then the phase separation quality is improved, but the synthesis complexity increases
Solution Approach 1:
The patent optimizes phase separation quality by controlling the number-average molecular weight ratio parameter within a specific range (0.3 to 2.0) rather than using extreme values. This moderate parameter optimization achieves reliable phase separation and domain formation while avoiding overly complex synthesis procedures that would be required for highly asymmetric or extreme molecular weight ratios.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the use of a single block copolymer for multiple pitches, enhancing the process margin and reducing defects in pattern formation, while maintaining thermal motility and achieving finer patterns.
Implementation Method 1
The block copolymer is separated (phase-separated) in micro regions due to repulsion between blocks incompatible with each other
Implementation Method 2
forming a finer pattern using a phase-separated structure formed by self-assembly of block copolymers
Implementation Method 3
subjected to the heat treatment or other processing to form a structure containing a regular periodic structure
Data Source
AI summary
A resin composition for forming a phase-separated structure contains a block copolymer that is formed of a first block, a second block, and a third block, which are bonded to one another. The structure of a constituent unit of a polymer constituting the first block is identical to the structure of a constituent unit of a polymer constituting the third block. The number-average molecular weight (Mn3) of the polymer constituting the third block is smaller than the number-average molecular weight (Mn1) of the polymer constituting the first block.


