Block Copolymer Self-Assembly for Nanostructure Formation

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Solution Overview

Problem

Current block copolymers lack effective self-assembling properties and etching selectivity in forming nanostructures, particularly on untreated substrates, which limits their application in advanced nanodevices and magnetic storage media.

Innovation Solution

A block copolymer comprising a first block with a structural unit represented by Structural Formula 1 and a second block with an aromatic structure containing halogen atoms, which enhances self-assembling properties and etching selectivity through specific interactions and thermal annealing, allowing vertical orientation on various surfaces.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional block copolymers are used, then the basic polymer structure is achieved, but self-assembling properties and etching selectivity are insufficient

Engineering Contradiction:

Improveself-assembling propertyVSAvoidease of forming nanostructures

Core Design Contradiction:

ReliabilityVSEase of manufacture

Solution Approach 1:

The patent introduces a specific structural unit (Formula 1) with particular functional groups into the polymer chain to create localized regions with enhanced self-assembling properties. This local modification allows the polymer to achieve reliable self-assembly without requiring complete structural redesign, thus improving reliability while maintaining ease of manufacture.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent creates a composite polymer structure by combining the structural unit of Formula 1 with conventional polymer blocks. This composite approach integrates the self-assembling capabilities of the specialized unit with the structural integrity of standard polymers, achieving both improved self-assembling properties and maintained manufacturability.

Inventive Principle:

Principle #40Composite materials

2Manufacturing precision

If conventional block copolymers are used, then the basic structure is achieved, but etching selectivity is insufficient for advanced nanodevices

Engineering Contradiction:

Improveetching selectivityVSAvoidpolymer structure complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent modifies specific parameters of the polymer structure, such as the chemical composition and functional groups in the structural unit of Formula 1, to enhance etching selectivity. By adjusting these parameters rather than completely redesigning the polymer architecture, the patent achieves improved manufacturing precision while controlling device complexity.

Inventive Principle:

Principle #35Parameter changes

3Ease of operation

If conventional block copolymers are used, then the basic polymer properties are achieved, but vertical orientation on untreated substrates cannot be achieved

Engineering Contradiction:

Improvevertical orientation capabilityVSAvoidsubstrate treatment requirement

Core Design Contradiction:

Ease of operationVSEase of manufacture

Solution Approach 1:

The patent designs the structural unit of Formula 1 to inherently possess properties that enable vertical orientation on untreated substrates. The polymer structure self-organizes into the desired orientation without requiring external substrate treatments, thus improving ease of operation while maintaining ease of manufacture by eliminating additional processing steps.

Inventive Principle:

Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The block copolymer exhibits excellent phase separation and self-assembling properties, enabling the formation of controlled nanostructures and improved etching selectivity, suitable for advanced applications in nanodevices and magnetic storage media.

Implementation Method 1

The block copolymer can form a regularly arranged structure, such as a sphere, a cylinder and a lamella, by phase separation.

Methodology Applied

Scientific EffectPhase separation:

Implementation Method 2

The size of a domain that is formed by the self-assembly phenomenon of a block copolymer can be adjusted over a wide range

Methodology Applied

Scientific EffectSelf-assembly: Self-Assembly

Implementation Method 3

which enhances self-assembling properties and etching selectivity through specific interactions and thermal annealing, allowing vertical orientation on various surfaces

Methodology Applied

Scientific EffectThermal annealing: Annealing

Data Source

PatentEP3202798B1Block copolymer

Publication Date: 2022.01.12 LG CHEM LTD

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AI summary

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.