Block Copolymer Self-Assembly for Semiconductor Security

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Solution Overview

Problem

Circuit counterfeiting in semiconductor devices poses a significant threat due to the ease of replicating security markings, allowing counterfeit units to be sold as genuine, potentially leading to critical system failures, especially with the rise of IoT devices.

Innovation Solution

Implementing a unique self-assembly (SA) pattern created using block copolymers on integrated circuits, which generates random and unpredictable patterns that serve as a 'fingerprint' for identification, stored and verified through a secure database, allowing for efficient and secure authentication.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional security markings (printed data, bar codes, fluorescent inks) are used on semiconductor devices, then security verification can be performed, but the markings can be easily replicated and counterfeited

Engineering Contradiction:
Improvesecurity verificationVSAvoidcounterfeiting difficulty
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent applies preliminary action by creating unique self-assembly patterns during the semiconductor manufacturing process itself, before the device is completed. These patterns are generated through block copolymer self-assembly and annealing processes that occur during fabrication, embedding the security feature inherently rather than adding it later. This preliminary creation ensures the patterns are difficult to replicate as they depend on specific manufacturing conditions that are hard to reproduce exactly.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent utilizes self-service through the self-assembly property of block copolymers. The block copolymer material automatically forms unique patterns through its own self-organization behavior during annealing, without requiring external guidance or control. This self-service mechanism creates inherently unique patterns that are difficult to replicate because they arise from spontaneous self-organization under specific thermal conditions, making counterfeiting extremely difficult while maintaining security verification capability.

Inventive Principle:
Principle #25Self-service

2Reliability

If complex security patterns are implemented to prevent counterfeiting, then security is improved, but manufacturing complexity and cost increase

Engineering Contradiction:
Improvecounterfeiting preventionVSAvoidmanufacturing process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies parameter changes by utilizing the thermal annealing process parameters to control block copolymer self-assembly. By adjusting temperature, time, and cooling rates during manufacturing, unique patterns emerge from the same material system. This approach creates high-security patterns without adding complex manufacturing steps, as the complexity arises naturally from parameter variations in an existing polymer annealing process rather than from additional fabrication steps.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The unique SA patterns provide a high level of security by making it impossible to clone, thus effectively preventing counterfeiting and ensuring the authenticity of semiconductor products, even in resource-constrained IoT devices.

Implementation Method 1

An image of a self-assembly (SA) pattern on a substrate from a scanner is received. The SA pattern has been initially created using a block copolymer (BCP) which has been annealed on the substrate.

Methodology Applied
Scientific EffectSelf-assembly: Self-Assembly

Data Source

PatentUS10573606B2Integrated circuit security
Publication Date: 2020.02.25 INTERNATIONAL BUSINESS MACHINE CORPORATION
  • US10573606B2 patent drawing
  • US10573606B2 patent drawing
  • US10573606B2 patent drawing

AI summary

Verifying a semiconductor product is disclosed. An image of a self-assembly (SA) pattern on a substrate from a scanner is received. The SA pattern has been initially created using a block copolymer (BCP) which has been annealed on the substrate. Data from the SA pattern is stored in a computer system. The SA pattern data is associated with the semiconductor product. The SA pattern is an information carrying security mark having a set of features with corresponding locations within the information carrying security mark which uniquely identify the semiconductor product.