Block Copolymer Self-Assembly Using Surface Energy Guide Patterns
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Solution Overview
Problem
Current microprocessing technologies face challenges in forming fine patterns at a low cost, particularly with the high costs associated with extreme ultraviolet (EUV) exposure tools and the difficulty in achieving regular patterns using block copolymers without guide patterns.
Innovation Solution
A method involving the formation of a guide pattern with alternating regions of different surface energies on a substrate, where the block copolymer layer undergoes microphase separation to create a lamellar block copolymer pattern with the first and second polymer blocks arranged alternately, allowing for the formation of finer patterns without the need for expensive exposure tools.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If expensive exposure tools such as EUV or ArF immersion exposure tools are used to form fine patterns, then manufacturing precision is improved, but production cost increases
Solution Approach 1:
The patent divides the pattern formation process into two stages: first forming a guide pattern with conventional lithography, then using block copolymer self-assembly to generate the final fine pattern. This segmentation allows each stage to use appropriately matched techniques, avoiding the need for expensive EUV tools while achieving fine pitch patterns.
Solution Approach 2:
The guide pattern acts as an intermediary structure that directs the self-assembly of block copolymers. By using the guide pattern as a template, the system achieves fine pattern formation without requiring expensive direct lithography tools, thus resolving the contradiction between precision and cost.
2Ease of manufacture
If block copolymer microphase separation is used to form fine patterns, then production cost is reduced, but pattern regularity and orientation control become difficult
Solution Approach 1:
The guide pattern is formed in advance to establish the desired pattern geometry and orientation before block copolymer deposition. This preliminary structuring ensures that subsequent block copolymer self-assembly occurs in a controlled manner, achieving both cost reduction and pattern regularity.
Solution Approach 2:
The guide pattern introduces local variations in surface properties (different materials with different surface energies) to selectively guide block copolymer orientation in specific regions. This local quality control ensures regular pattern formation while maintaining the cost benefits of conventional lithography.
3Manufacturing precision
If the wavelength of light used in lithography is shortened to achieve higher resolution, then manufacturing precision is improved, but production cost increases
Solution Approach 1:
Instead of directly forming fine patterns through high-resolution lithography, the system creates a lower-resolution guide pattern that serves as a template. The block copolymers then self-assemble to generate the final fine pattern, effectively copying and amplifying the guide pattern features at a lower cost.
Solution Approach 2:
The patent changes the approach from directly controlling pattern dimensions through lithography parameters (wavelength, numerical aperture) to controlling self-assembly parameters (block copolymer composition, annealing conditions). This parameter change enables fine pattern formation using conventional, lower-cost exposure tools.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the formation of fine patterns with a wider process margin and higher accuracy, reducing the cost of pattern formation by utilizing less expensive exposure tools and achieving a finer pitch than conventional methods.
Implementation Method 1
forming a guide pattern including a first region having a first surface energy and a second region having a second surface energy which is different from the first surface energy
Data Source
AI summary
According to one embodiment, there is provided a method of forming a pattern, includes forming a guide pattern including a first region having a first surface energy and a second region having a second surface energy on a to-be-processed film, the first and second regions alternately arranged in one direction, forming a block copolymer layer on the guide pattern, and causing microphase separation in the block copolymer layer, the microphase-separated structure is a lamellar block copolymer pattern.